光电工程, 2019, 46 (4): 18022010, 网络出版: 2019-05-04  

SiO2光学薄膜的吸收边特性

Characterictics of absorption edge of SiO2 films
作者单位
1 中国科学院光电技术研究所, 四川成都 610209
2 中国科学院大学, 北京 100049
3 电子科技大学光电科学与工程学院, 四川成都 610054
引用该论文

孔明东, 李斌成, 郭春, 柳存定, 何文彦. SiO2光学薄膜的吸收边特性[J]. 光电工程, 2019, 46(4): 18022010.

Kong Mingdong, Li Bincheng, Guo Chun, Liu Chunding, He Wenyan. Characterictics of absorption edge of SiO2 films[J]. Opto-Electronic Engineering, 2019, 46(4): 18022010.

参考文献

[1] Dijon J, Rafin B, Pelle C, et al. One-hundred joule per square centimeter 1.06-μm mirrors[J]. Proceedings of SPIE, 2000, 3902: 158–168.

[2] Scherer K, Nouvelot L, Lacan P, et al. Optical and mechanical characterization of evaporated SiO2 layers. Long-term evolu-tion[J]. Applied Optics, 1996, 35(25): 5067–5072.

[3] Ji Y Q, Investigation of high performance SiO2 thin film pre-pared by ion beam sputtering deposition[D]. Harbin Institute of Technology, 2013: 68–94.季一勤. 离子束溅射高性能 SiO2薄膜特性研究[D].哈尔滨: 哈尔滨工业大学, 2013: 68–94.

[4] Beauville F, Buskulic D, Flaminio R, et al. Low-loss coatings for the VIRGO large mirrors[J]. Proceedings of SPIE, 2004, 5250: 483–492.

[5] Lorenzi R, Brovelli S, Meinardi F, et al. Role of sol-gel net-working and fluorine doping in the silica Urbach energy[J]. Journal of Non-Crystalline Solids, 2011, 357(8–9): 1838–1841.

[6] Kranj.ec M, Studenyak I P, Kurik M V. On the Urbach rule in non-crystalline solids[J]. Journal of Non-Crystalline Solids, 2009, 355(1): 54–57.

[7] Skuja L, Kajihara K, Ikuta Y, et al. Urbach absorption edge of silica: reduction of glassy disorder by fluorine doping[J]. Journal of Non-Crystalline Solids, 2004, 345–346: 328–331.

[8] Al-Ani S K J, Arshak K I, Hogarth C A. The optical absorption edge of amorphous thin films of silicon monoxide[J]. Journal of Materials Science, 1984, 19(6): 1737–1748.

[9] Palik E D. Handbook of optical constants of solids[M]. Aca-demic press, 1998: 749–759.

[10] Guo C, Kong M D, Lin D W, et al. Determination of optical constants in DUV/VUV[J]. Chinese Optics Letters, 2013, 11(10): S10607.

[11] Guo C, Lin D W, Zhang Y D, et al. Determination of optical constants of LaF3 films from spectrophotometric measure-ments[J]. Acta Optica Sinica, 2011, 31(7): 0731001.郭春, 林大伟, 张云洞, 等. 光度法确定 LaF3薄膜光学常数 [J].光学学报, 2011, 31(7): 0731001.

[12] Huang K. Solid State Physics[M]. Beijing: Higher Education Press, 1988.黄昆. 固体物理学[M]. 北京: 高等教育出版社, 1988.

[13] Skuja L. Optically active oxygen-deficiency-related centers in amorphous silicon dioxide[J]. Journal of Non-Crystalline Solids, 1998, 239(1–3): 16–48.

[14] Skuja L, Hosono H, Hirano M. Laser-induced color centers in silica[J]. Proceedings of SPIE, 2001, 4347: 155–168.

[15] Pacchioni G, Skuja L, Griscom D L. Defects in SiO2 and Re-lated Dielectrics: Science and Technology[M]. Dordrecht: Springer, 2000: 73–116.

[16] Revesz A G, Hughes H L. The structural aspects of non-crystalline SiO2 films on silicon: a review[J]. Journal of Non-Crystalline Solids, 2003, 328(1–3): 48–63.

孔明东, 李斌成, 郭春, 柳存定, 何文彦. SiO2光学薄膜的吸收边特性[J]. 光电工程, 2019, 46(4): 18022010. Kong Mingdong, Li Bincheng, Guo Chun, Liu Chunding, He Wenyan. Characterictics of absorption edge of SiO2 films[J]. Opto-Electronic Engineering, 2019, 46(4): 18022010.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!