Parallel laser writing system with scanning Dammann lithography

Feng Zhu; Jianyong Ma; Wei Huang; Jin Wang; Changhe Zhou

doi:doi:10.3788/col201412.080501

Chinese Optics Letters, 2014, 12 (8): 080501, Published Online: Jul. 31, 2014

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论文大纲

Feng Zhu Jianyong Ma Wei Huang Jin Wang Changhe Zhou

Author Affiliations

050.1950 Diffraction gratings 220.3740 Lithography 220.4000 Microstructure fabrication

Abstract

Scanning Dammann lithography (SDL) is proposed and implemented, which uses a Dammann grating to generate multiple beams with sharp step boundary for writing large-sized gratings efficiently. One of the most attractive advantages is that this technique can accelerate the writing speed, e.g. 1 \times 32 Dammann grating can be 32 times faster than the single laser scanning system. More importantly, the uniformity of the multi-beams-written lines is much better than the single laser beam scanning system in consideration of the environmental effects such as air turbulence, thermal instability, etc. Using the SDL system, a three-port high-efficiency beam splitter at visible wavelengths is fabricated quickly, and the theoretical and experimental diffraction efficiencies are both higher than 90%. Therefore, SDL should be a useful tool for fabrication of large-sized gratings.

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Feng Zhu, Jianyong Ma, Wei Huang, Jin Wang, Changhe Zhou. Parallel laser writing system with scanning Dammann lithography[J]. Chinese Optics Letters, 2014, 12(8): 080501.

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