红外, 2014, 35 (7): 24, 网络出版: 2014-07-22
基于常温磁控溅射法的二氧化钒薄膜制备方法研究
Vanadium Dioxide Thin Film Prepared by Magnetron Sputtering at Room Temperature
引用该论文
刘星星. 基于常温磁控溅射法的二氧化钒薄膜制备方法研究[J]. 红外, 2014, 35(7): 24.
LIU Xing-xing. Vanadium Dioxide Thin Film Prepared by Magnetron Sputtering at Room Temperature[J]. INFRARED, 2014, 35(7): 24.
刘星星. 基于常温磁控溅射法的二氧化钒薄膜制备方法研究[J]. 红外, 2014, 35(7): 24. LIU Xing-xing. Vanadium Dioxide Thin Film Prepared by Magnetron Sputtering at Room Temperature[J]. INFRARED, 2014, 35(7): 24.