红外, 2014, 35 (7): 24, 网络出版: 2014-07-22   

基于常温磁控溅射法的二氧化钒薄膜制备方法研究

Vanadium Dioxide Thin Film Prepared by Magnetron Sputtering at Room Temperature
刘星星 1,2,*
作者单位
1 中国科学院上海技术物理研究所, 上海 200083
2 上海节能镀膜玻璃工程技术研究中心, 上海 200083
引用该论文

刘星星. 基于常温磁控溅射法的二氧化钒薄膜制备方法研究[J]. 红外, 2014, 35(7): 24.

LIU Xing-xing. Vanadium Dioxide Thin Film Prepared by Magnetron Sputtering at Room Temperature[J]. INFRARED, 2014, 35(7): 24.

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刘星星. 基于常温磁控溅射法的二氧化钒薄膜制备方法研究[J]. 红外, 2014, 35(7): 24. LIU Xing-xing. Vanadium Dioxide Thin Film Prepared by Magnetron Sputtering at Room Temperature[J]. INFRARED, 2014, 35(7): 24.

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