激光与光电子学进展, 2013, 50 (11): 111404, 网络出版: 2013-10-20  

腔面非注入区技术在808 nm GaAs/AlGaAs激光二极管列阵中的应用

808 nm GaAs/AlGaAs Laser Diode Bar with Current Non-Injection Areas Near the Facets
作者单位
1 证据科学教育部重点实验室(中国政法大学), 北京 100088
2 中国科学院半导体研究所, 北京 100083
摘要
在808 nm GaAs/AlGaAs激光二极管列阵的前后腔面两端约25 μm长的区域进行氦离子注入,使p型GaAs获得高的电阻率,形成腔面电流非注入区,以此来提高腔面灾变性损伤(COD)阈值。常规条宽100 μm,含有19个发光单元的1 cm列阵激光器的COD阈值功率为30 W,而带有腔面非注入区的器件的最大输出功率达到了42.7 W,没有发生失效。
Abstract
After He ion implantation, p-GaAs will obtain higher resistivity than before. To improve the catastrophic optical damage (COD) level of 808 nm GaAs/AlGaAs laser diode bar, about 25 μm-long current non-injection areas are introduced near both facets by He ion implantation. The COD level of a conventional 1 cm laser diode bar with 19 emitters is 30W, while the He ion implantation 1 cm laser diode bar exhibits no COD failure at 42.7 W.
参考文献

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刘斌, 刘媛媛. 腔面非注入区技术在808 nm GaAs/AlGaAs激光二极管列阵中的应用[J]. 激光与光电子学进展, 2013, 50(11): 111404. Liu Bin, Liu Yuanyuan. 808 nm GaAs/AlGaAs Laser Diode Bar with Current Non-Injection Areas Near the Facets[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111404.

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