光学学报, 1998, 18 (12): 1703, 网络出版: 2006-10-18   

微细光刻中部分相干系统成像研究

Study of Partical Coherent Imagery System in Microlithography
作者单位
中国科学院光电技术研究所微细加工光学技术国家重点实验室, 成都 610209
摘要
分析了投影光刻系统中部分相干成像的过程,结果表明部分相干成像的像强是相干成像的像强对光源上每一点互相干强度的权重和。得出了近年来改进照明条件提高分辨力的物理本质:部分相干成像系统是一个空间频率可变的系统,频率的调制是通过照明函数的变化来实现的。提出了进一步提高光刻分辨力的新途径。
Abstract
The physical process of partially coherent image formation in the projection lithography has been analyzed. It has been proved that the image intensity distribution in a partially coherent imagery system is the weighted sum of the intensities of the result from coherent imagery with respect to each point in the source. The physical mechanism of resolution enhancement by improving illumination condition has also been investigated. The results show that a partially coherent imaging system is practically a variable spatial frequency system. Frequency modulation can be realized by adjusting illumination function. New approach to resolution enhancement is given.
参考文献

[1] J. Bokor, A. R. Neureuther, W. G. Oldham. Advanced lithography for ULSI. IEEE. Circuits & Devices, 1996, 43(1): 11~15

[2] H. H. Hopkins. On the diffraction theory of optical images. Proc. R. Soc., (London), 1953, A217(3): 408~432

[3] B. J. Thompson. Image formation with partially coherent light. In: E. Wolf, ed, Progressin Optics, 1969, 7: 169~230

[4] P. F. Luehrmann, P. VanOorschot et al.. 0.35 μm lithography using off-axis illumination. Optical Laser Microlithography VI, Proc. SPIE, 1993, 1927: 103~123

[5] N. Shiraishi, S. Hirukawa, Y. Takeuchi et al.. New imagingtechnique for 64 M-DRAM. Optical Laser Microlithography V, Proc. SPIE, 1992, 1674: 741~746

[6] Tohru Ogawa, Masaya Uematsu, Toshiyuki Ishimaru et al.. The effective light source optimization with the modified beam for the depth-of-focus enhancements. Optical Laser Microlithography VI, Proc. SPIE, 1994, 2197: 19~30

罗先刚, 陈旭南, 姚汉民. 微细光刻中部分相干系统成像研究[J]. 光学学报, 1998, 18(12): 1703. 罗先刚, 陈旭南, 姚汉民. Study of Partical Coherent Imagery System in Microlithography[J]. Acta Optica Sinica, 1998, 18(12): 1703.

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