光学学报, 2001, 21 (12): 1463, 网络出版: 2006-08-10   

金属有机化学汽相沉积生长InGaN薄膜的研究

InGaN Films Grown by Metalorganic Chemical Vapor Deposition
作者单位
南昌大学材料科学研究所,南昌,330047
摘要
以Al2O3为衬底,采用金属有机汽相沉积(MOCVD)技术在GaN膜上生长了InxGa1-xN薄膜.以卢瑟福背散射/沟道技术和光致发光技术对InxGa1-xN/GaN/Al2O3样品进行了分析.研究表明,金属有机汽相沉积生长高In组分InxGa1-xN薄膜有一最佳TMIn/TEGa摩尔流量比.在一定范围内,降低其摩尔流量比,合金的生长速率增高,In组分提高;进一步降低TMIn/TEGa摩尔流量比,导致In组分下降.研究还表明,InGaN薄膜的结晶品质随In组分的增大而下降,InGaN薄膜的In组分由0.04增大到0.10,其最低沟道产额比由4.1%增至11.0%.
Abstract
The InGaN/GaN films were grown on (0001) sapphire substrates by metalorganic chemical vapor deposition (MOCVD) at atmospheric pressure. Properties of these films were investigated by Rutherford backscattering/channeling measurements and photoluminescence technique. The study indicated that there was an optimum TMIn/TEGa ratio to obtain high In mole fraction In x Ga 1-x N films. The In mole fraction in In x Ga 1-x N films will increase by decreasing the TMIn/TEGa ratio in some range. Surface minimum yields χ min of In x Ga 1-x N films changed from 4.1% to 11.0% when the x value of In x Ga 1-x N varied from 0.04 to 0.10.
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江风益, 李述体, 王立, 彭学新, 熊传兵. 金属有机化学汽相沉积生长InGaN薄膜的研究[J]. 光学学报, 2001, 21(12): 1463. 江风益, 李述体, 王立, 彭学新, 熊传兵. InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. Acta Optica Sinica, 2001, 21(12): 1463.

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