液晶与显示, 2016, 31 (4): 370, 网络出版: 2016-04-13
ITO像素电极工序对于HADS 产品TFT特性的影响
Effects of pixel ITO process on TFT characteristics of HADS product
引用该论文
林致远, 杨成绍, 邹志翔, 操彬彬, 黄寅虎, 文锺源, 王章涛. ITO像素电极工序对于HADS 产品TFT特性的影响[J]. 液晶与显示, 2016, 31(4): 370.
LIN Zhi-yuan, YANG Cheng-shao, ZOU Zhi-xiang, CAO Bin-bin, Huang Yin-hu, WEN Zhong-yuan, WANG Zhang-tao. Effects of pixel ITO process on TFT characteristics of HADS product[J]. Chinese Journal of Liquid Crystals and Displays, 2016, 31(4): 370.
林致远, 杨成绍, 邹志翔, 操彬彬, 黄寅虎, 文锺源, 王章涛. ITO像素电极工序对于HADS 产品TFT特性的影响[J]. 液晶与显示, 2016, 31(4): 370. LIN Zhi-yuan, YANG Cheng-shao, ZOU Zhi-xiang, CAO Bin-bin, Huang Yin-hu, WEN Zhong-yuan, WANG Zhang-tao. Effects of pixel ITO process on TFT characteristics of HADS product[J]. Chinese Journal of Liquid Crystals and Displays, 2016, 31(4): 370.