中国激光, 2016, 43 (9): 0901007, 网络出版: 2018-05-25   

基于FLUENT的准分子激光器气体流场数值仿真

FLUENT-Based Numerical Simulation of Gas Flow Field of Excimer Laser
作者单位
1 中国科学院安徽光学精密机械研究所, 安徽 合肥 230031
2 中国科学技术大学, 安徽 合肥 230026
摘要
利用ICEM软件对简化后的准分子激光器气体流道进行二维截面网格划分。基于realizable k-ε湍流模型和多参考系(MRF)模型,利用FLUENT软件对激光器内部气体流动进行稳态流场仿真,获得了气体流动速度大小和分布。仿真结果表明,气体平均流速与风机转速大小呈线性关系,风机扭矩与风机转速的平方也呈线性关系。采用皮托管实测流速分布并与仿真结果进行对比,它们之间的一致证实了仿真结果的可靠性。
Abstract
With ICEM software, the mesh generation of the two-dimensional cross-section of the simplified gas flow channel of excimer laser is introduced. Based on realizable k-ε model and multiple reference frame (MRF) model, the simulation to the steady-state flow field of gas flowing inside laser with FLUENT software, and the velocity value and its distribution of gas flow are obtained. The simulation results indicate that there exist linear relationships between the average gas flow velocity and the rotational speed of blowers, also between the torsional moment and the square of rotational speed of blowers. The gas flow velocity distribution measured by a pitot tube is compared with the simulation results, and the consistency between them confirms the validity of the latter.
参考文献

[1] Amada Y, Steiger T D, Ujazdowski R C. Cross-flow fan impeller for a transversely excited, pulsed, gas discharge laser: US8814522B2[P]. 2014-08-26.

[2] Tusshima H, Katsuumi H, Ikeda H, et al. Extremely-long life and low-cost 193 nm excimer laser chamber technology for 450 mm wafer multi-patterning lithography[C]. SPIE, 2014, 9052: 90521E.

[3] Matsunaga T, Enami T, Kakizaki K, et al. Extreme high NA, high throughput scanner compatible 4 kHz KrF excimer laser for DUV lithography[C]. SPIE, 2001, 4346: 1617-1626.

[4] Oh C, Fleurov V B, Hofmann T, et al. Production-ready 4 kHz ArF laser for 193 nm lithography[C]. SPIE, 2002, 4691: 1752-1760.

[5] Tanaka S, Tsushima H, Nakaike T, et al. GT40A: Durable 45 W ArF injection-lock laser light source for dry/immersion lithography[C]. SPIE, 2006, 6154: 61542O.

[6] Kakizaki K, Sasaki Y, Inoue T, et al. High-repetition-rate (6 kHz) and long-pulse-duration (50 ns) ArF excimer laser for sub-65 nm lithography[J]. Review of Scientific Instruments, 2006, 77(3): 035109.

[7] Hori T, Ishihara T, Kakizaki K. Excimer laser device operable at high repetition rate and having high band-narrowing efficiency: US7782922B2[P]. 2010-08-24.

[8] 余吟山, 游利兵, 梁勖, 等. 准分子激光技术发展[J]. 中国激光, 2010, 37(9): 2253-2270.

    Yu Yinshan, You Libing, Liang Xu, et al. Progress of excimer lasers technology[J]. Chinese J Lasers, 2010, 37(9): 2253-2270.

[9] 胡坤, 李振北. ANSYS ICEM CFD工程实例详解[M]. 北京: 人民邮电出版社, 2014: 38-39.

    Hu Kun, Li Zhenbei. Engineering examples of ANASYS ICEM CFD[M]. Beijing: Posts & Telecom Press, 2014: 38-39.

[10] 王福军. 计算流体动力学分析: CFD软件原理与应用[M]. 北京: 清华大学出版社, 2004: 7-11.

    Wang Fujun. Analysis of computational fluid dynamics: Theory and application of CFD[M]. Beijing: Tsinghua University Press, 2004: 7-11.

[11] 何川, 郭立军. 泵与风机[M]. 北京: 中国电力出版社, 2008: 82-85.

    He Chuan, Guo Lijun. Pumps and Fans[M]. Beijing: China Electric Power Press, 2008: 82-85.

朱能伟, 方晓东. 基于FLUENT的准分子激光器气体流场数值仿真[J]. 中国激光, 2016, 43(9): 0901007. Zhu Nengwei, Fang Xiaodong. FLUENT-Based Numerical Simulation of Gas Flow Field of Excimer Laser[J]. Chinese Journal of Lasers, 2016, 43(9): 0901007.

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