基于FLUENT的准分子激光器气体流场数值仿真
[1] Amada Y, Steiger T D, Ujazdowski R C. Cross-flow fan impeller for a transversely excited, pulsed, gas discharge laser: US8814522B2[P]. 2014-08-26.
[2] Tusshima H, Katsuumi H, Ikeda H, et al. Extremely-long life and low-cost 193 nm excimer laser chamber technology for 450 mm wafer multi-patterning lithography[C]. SPIE, 2014, 9052: 90521E.
[3] Matsunaga T, Enami T, Kakizaki K, et al. Extreme high NA, high throughput scanner compatible 4 kHz KrF excimer laser for DUV lithography[C]. SPIE, 2001, 4346: 1617-1626.
[4] Oh C, Fleurov V B, Hofmann T, et al. Production-ready 4 kHz ArF laser for 193 nm lithography[C]. SPIE, 2002, 4691: 1752-1760.
[5] Tanaka S, Tsushima H, Nakaike T, et al. GT40A: Durable 45 W ArF injection-lock laser light source for dry/immersion lithography[C]. SPIE, 2006, 6154: 61542O.
[6] Kakizaki K, Sasaki Y, Inoue T, et al. High-repetition-rate (6 kHz) and long-pulse-duration (50 ns) ArF excimer laser for sub-65 nm lithography[J]. Review of Scientific Instruments, 2006, 77(3): 035109.
[7] Hori T, Ishihara T, Kakizaki K. Excimer laser device operable at high repetition rate and having high band-narrowing efficiency: US7782922B2[P]. 2010-08-24.
[8] 余吟山, 游利兵, 梁勖, 等. 准分子激光技术发展[J]. 中国激光, 2010, 37(9): 2253-2270.
[9] 胡坤, 李振北. ANSYS ICEM CFD工程实例详解[M]. 北京: 人民邮电出版社, 2014: 38-39.
Hu Kun, Li Zhenbei. Engineering examples of ANASYS ICEM CFD[M]. Beijing: Posts & Telecom Press, 2014: 38-39.
[10] 王福军. 计算流体动力学分析: CFD软件原理与应用[M]. 北京: 清华大学出版社, 2004: 7-11.
Wang Fujun. Analysis of computational fluid dynamics: Theory and application of CFD[M]. Beijing: Tsinghua University Press, 2004: 7-11.
[11] 何川, 郭立军. 泵与风机[M]. 北京: 中国电力出版社, 2008: 82-85.
He Chuan, Guo Lijun. Pumps and Fans[M]. Beijing: China Electric Power Press, 2008: 82-85.
朱能伟, 方晓东. 基于FLUENT的准分子激光器气体流场数值仿真[J]. 中国激光, 2016, 43(9): 0901007. Zhu Nengwei, Fang Xiaodong. FLUENT-Based Numerical Simulation of Gas Flow Field of Excimer Laser[J]. Chinese Journal of Lasers, 2016, 43(9): 0901007.