光学学报, 2014, 34 (10): 1031001, 网络出版: 2014-09-09   

钽掺杂氧化钨薄膜电致变色性能

Electrochromic Properties of Ta Doped Tungsten Oxide Thin Films
作者单位
1 南昌大学材料科学与工程学院, 江西 南昌 330031
2 中国科学院宁波材料技术与工程研究所, 浙江 宁波 315201
引用该论文

孙喜莲, 方燕群, 曹洪涛. 钽掺杂氧化钨薄膜电致变色性能[J]. 光学学报, 2014, 34(10): 1031001.

Sun Xilian, Fang Yanqun, Cao Hongtao. Electrochromic Properties of Ta Doped Tungsten Oxide Thin Films[J]. Acta Optica Sinica, 2014, 34(10): 1031001.

参考文献

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[4] 赵莉丽, 苏革, 曹立新, 等. 铜掺杂氧化镍电致变色薄膜的制备及性能[J]. 光学学报, 2011, 31(4): 0431001.

    Zhao Lili, Su Ge, Cao Lixin, et al.. Fabrication and properties of Cu-doped NiO electrochromic thin films [J]. Acta Optica Sinica, 2011, 31(4): 0431001

[5] 吕刚, 吴永刚, 伍和云, 等. 掺有TiO2及纳米Ag的WO3薄膜的电致变色研究 [J]. 光学学报, 2011, 31(12): 1231001.

    Lü Gang, Wu Yonggang, Wu Heyun, et al.. Preparation and characterization of WO3 thin films doped with TiO2 and Ag nano layer [J]. Acta Optica Sinica, 2011, 31(12): 1231001.

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[8] R Kirchgeorg, S Berger, P Schmuki. Ultra fast electrochromic switching of nanoporous tungsten-tantalum oxide films [J]. Chem Commun, 2011, 47(3): 1000-1002.

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[12] S U Yun, S J Yoo, J W Lim, et al.. Enhanced electrochromic properties of Ir-Ta oxide grown using a cosputtering system [J]. J Electrochem Soc, 2010, 157(7): J256-J260.

孙喜莲, 方燕群, 曹洪涛. 钽掺杂氧化钨薄膜电致变色性能[J]. 光学学报, 2014, 34(10): 1031001. Sun Xilian, Fang Yanqun, Cao Hongtao. Electrochromic Properties of Ta Doped Tungsten Oxide Thin Films[J]. Acta Optica Sinica, 2014, 34(10): 1031001.

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