采用一种亲水性固结磨料抛光垫(FAP),通过单因素实验法,系统地研究了抛光K9光学玻璃过程中抛光时间、偏心距、压力、转速、抛光液流量及pH值等工艺参数对材料去除速率(MRR)和表面粗糙度的影响规律,并对实验结果进行了解释。结果表明：随着抛光时间的延长,K9光学玻璃的MRR逐渐呈下降趋势;在抛光20 min时,MRR达最大值310 nm/min,且表面粗糙度降至最低值为2.73 nm;选择较大的偏心距和碱性抛光液环境均有利于提高MRR;随着抛光盘转速的升高,MRR将显著增大。而在一定范围内,抛光压力和抛光液流量对MRR的影响不大。

A new hydrophilic fixed abrasive polishing pad (FAP) was studied. Single factor experiment method was employed to explore the effect of polishing parameters such as polishing time,eccentricity,pressure,rotational speed,flow rate and pH value of slurry with FAP on material removal rate (MRR) and surface roughness of K9 optical glass. Results show that MRR drops with time extension. After 20 min polishing,MRR reaches a maximum of 310 nm/min and surface roughness reaches a minimum of 2.73 nm. Large eccentricity distance and alkaline slurry are helpful to improve MRR. With the increase of rotational speed,MRR rises significantly. While in certain range,applied pressure and slurry flow rate have little effect on MRR.