[1] SHAO Jian-da,FAN Zheng-xiu,TANG Gong-jie,et al.Fabrication and characterization of sputtered W/C multilayer mirror for soft X-ray[J].Acta Phys Sin,1994,43(12):104-111.邵建达,范正修,唐功杰,等.W/C超薄多层膜的制备及其结构与光学特性分析[J].物理学报,1994,43(12):104-111.

[2] WINDT D L,CASH W C,SCOTT M,et al.Optical constants for thin films of Ti,Zr,Nb,Mo,Ru,Rh,Pd,Ag,Hf,Ta,W,Re,Ir,Os,Pt and Au from 24 A to 1216 A[J].Appl Opt,1998,27(2):246-278.

[3] WINDT D L,XU V.Optical constants of single-crystal GaAs and sputtered C,Si Cr3C2,Mo,and W[J].Appl Opt,1991,30(1):15-25.

[4] TARRIO C,WATTS R N,LUCATORTO T B,et al.Optical constants of in situ-deposited films of important extremeultraviolet multilayer mirror materials[J].Appl Opt,1998,37(19):4100-4104.

[5] BARTSCH F R,BIRKEN H G,KUNZ C,et al.Reflectance and total photoelectric yield measurements of silicon wafers in the XUV spectral range[J].Semicond Sci Technol,1990,5(9):974-979.

[6] . Investigations on the consistency of optical constants in the XUV determined by different methods[J]. Rev Sci Instrum, 1989, 60(7): 2223-2226.

[7] SOUFLI R,GULLIKSON E M.Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet-soft-x-ray region[J].Appl Opt,1999,36(22):5499-5507.

[8] GULLIKSON E M,DENHAM P,MROWKA S,et al.Absolute photoabsorption measurements of Mg,Al,and Si in the soft-xray region below the L2,3 edges[J].Phy Rev B,1994,49(23):16283-6288.

[9] USPENSKII Y A,SEELY J F,POPOV N L,et al.Efficient method for the determination of extreme-ultraviolet optical constants in reactive materials:application to scandium and titanium[J].JOSA A,2004,21:298-305.

[10] DAMBACH S,BACKE H,DOERK T H,et al.Novel interferometer in the soft X-ray region[J].Phy Rev Lett,1998,80(25):5473-5476.

[11] CHANG C,ANDERSON E,NAULLEAU P,et al.Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer[J].Opt Lett,2002,27(12):1028-1030.

[12] JACKSON J D.Classical electrodynamics[M].New York:Wiley,1965,Chap.7.

[13] ATTWOODD.Soft X-rays rays and extreme ultraviolet radiation:principles and applications[M].Cambridge:Cambridge University Press,1999,Chap.3.

[14] ZHU Jie,CUI Ming-qi,ZHENG Lei,et al.A study of annealed Mo/Si/C multilayer film by synchrotron radiation[J].Nucler Techniques,2004,27(7):489-493.朱杰,崔明启,郑雷,等.Mo/Si/C多层膜退火后的同步辐射研究[J].核技术,2004,27(7):489-493.

[15] BAIHai-li,JIANG En-yong,WU Ping,et al.Multilayer film for soft X-ray[J].Chinese Science Bulletin,1995,44 (8):3-10.白海力,姜恩永,吴萍,等.软X射线光学多层膜[J].科学通报,1999,44(8):3-10.

[16] CAOJian-lin,YANAGIHARA M,YAMAMOTO M,et al.Simultaneous determination of the optical constants and thickness of very thin films by using soft-x-ray reflectance measurements[J].Appl Opt,1994,33:2013-2017.

[17] http://www-cxro.lbl.gov/optical_constants/getdb2.htm.

[18] JAMES R W.The optical principles of the diffraction of X-rays[M].Woodbridge:OxBow Press,1982:168.

[19] NAMIOKA T.Current research activities in the field of multilayers for soft X-rays in japan[J].Revue Phys Appl,1988,23(10):1711-172.