红外与毫米波学报, 2014, 33 (1): 40, 网络出版: 2014-03-14  

低温磁控溅射制备CdS薄膜的结构和光学特性

Structural and optical properties of CdS thin films prepared by RF sputtering
作者单位
1 上海电力学院 数理学院,上海200090
2 上海大学材料系,上海200072
3 绍兴文理学院 物理系,浙江 绍兴312000
引用该论文

朱燕艳, 徐闰, 方泽波. 低温磁控溅射制备CdS薄膜的结构和光学特性[J]. 红外与毫米波学报, 2014, 33(1): 40.

ZHU Yan-Yan, XU Run, FANF Ze-Bo. Structural and optical properties of CdS thin films prepared by RF sputtering[J]. Journal of Infrared and Millimeter Waves, 2014, 33(1): 40.

参考文献

[1] Kathirvel D, Suriyanayanan N, Pabahar S, et al. Structural, Optical and Electrical properties of chemical bath deposited CdS thin films[J]. Chalcogenide Letters, 2011, 8(12): 739-745.

[2] Lo Y S, Choubey R K, Yu W C, et al. Shallow bath chemical deposition of CdS thin film[J], Thin Solid Films, 2011, 520(1) 217-223.

[3] Gonzalez G, Krishnan B, Avellaned D, et al. Modification of optical and electrical properties of chemical bath deposited CdS using plasma treatments[J]. Thin Solid Films, 2011, 519(21): 7587-7591.

[4] Aksu S, Bacaksiz E, Parlak M, et al. Structural, optical and magnetic properties of Mn diffusion-doped CdS thin films prepared by vacuum evaporation[J]. Materials Chemistry and Physics, 2011, 130(1): 340-345.

[5] Toma O, Pascu R, Dinescu M, et al. Grtwth and characterization of nanocrystalline CdS thin films[J]. Chalcogenide Letters, 2011, 8(9): 541-548.

[6] Elassali K, Boustani M, Khiara A, et al. Some Structural and Optical Properties of CdS Thin Films Prepared by RF Sputtering[J]. Physica status solidi, 2000, 178(2): 701-705.

[7] Sun1 Y H, Ge Y J, Li W W, et al. Structural and optical analysis of CdS thin films grown by magnetron sputtering technique[J]. Journal of Physics: Conference Series, 2011, 276: 012187.1-6.

[8] Rakhshani A E, Al-Azab A S, Characterization of CdS films prepared by chemical-bath deposition[J]. Journal of Physics: Condens. Matter, 2000, 12(40): 8745-8760.

朱燕艳, 徐闰, 方泽波. 低温磁控溅射制备CdS薄膜的结构和光学特性[J]. 红外与毫米波学报, 2014, 33(1): 40. ZHU Yan-Yan, XU Run, FANF Ze-Bo. Structural and optical properties of CdS thin films prepared by RF sputtering[J]. Journal of Infrared and Millimeter Waves, 2014, 33(1): 40.

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