金属薄膜厚度小于电子自由程对其光反射率的影响

林育琼; 冯仕猛; 王坤霞; 顾俊; 刘少军

光子学报, 2011, 40 (2): 263, 网络出版: 2011-03-08

金属薄膜厚度小于电子自由程对其光反射率的影响

Effects of Film Thickness Less than Electrical Mean Free Path on Reflectivity

论文大纲

林育琼 ^1,*冯仕猛 ¹王坤霞 ¹顾俊 ²刘少军 ²

作者单位

¹ 上海交通大学物理系，上海 200240

² 上海神舟新能源发展有限公司，上海 201112

金属薄膜反射率平均自由程电导率 Metal thin film Reflectivity Mean free path Conductivity

摘要

提出了金属薄膜厚度对薄膜中自由电子的平均自由程影响的物理模型,并给出了薄膜中自由电子的平均自由程的修正公式.理论研究表明：当膜厚小于自由电子的平均自由程时，薄膜中电子平均自由程随膜厚的减小而减小;当膜厚大于或等于自由电子的平均自由程时，薄膜中电子的平均自由程与块状材料一样.利用薄膜中电子平均自由程的计算公式，修正了薄膜导电率的基本理论表达式，再利用金属薄膜的反射率与薄膜导电率的关系，得出金属薄膜厚度对其光反射率的影响.计算机模拟表明：当薄膜厚度小于电子自由程时，金属薄膜反射率随薄膜厚度变化而呈非线性关系.

Abstract

A physical model was proposed to illustrate the influence of metal film thickness on electrical mean free path, and the formula of electrical mean free path was modified based on this model. The results demonstrate that the electrical mean free path decreases with film thickness decreasing, when the film thickness is less than the mean free path. Otherwise it is a constant as bulk material. The film conductivity expression was also modified based on this formula. Combining with the relationship between metal films′ conductivity and reflectivity, the formula of thin film conductivity with different thickness was put forward. Computer simulations show that when the film thickness is less than the electrical mean free path, the changes of metal film reflectivity are nonlinear.

参考文献

[1] 胡小草, 刁训刚, 郝雷. 大面积柔性基底TiO2/Ag/Ti/TiO2多层膜的制备及其光电和红外发射特性［J］. 稀有金属, 2008, 32(3): 300-305.

HU Xiao-cao, DIAO Xun-gang, HAO Lei. Preparation of large area TiO2／Ag／Ti／TiO2 multilayers on flexible substrate and its optoelectronic and infrared emission properties［J］. Chinese Journal of Rare Metals, 2008, 32(3): 300-305.

[2] . Metal film characterization with qualified spreading resistance[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004, 22(1): 444-449.

[3] . Plasma etching of copper films at low temperature[J]. Microelectronic Engineering, 2007, 84(1): 105-108.

[4] . Surface and grain boundary scattering studied in beveled polycrystalline thin copper films[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004, 22(4): 1830-1833.

[5] 范平. 超薄金属膜的电导特性［J］. 金属学报, 1999, 35(3): 261-264.

FAN Ping. Electric conductivity characteristics of ultrathin metallic films［J］. Acta Metallurgica Sinica, 1999, 35(3): 261-264.

[6] 王德飞, 齐文宗, 郭春凤. 超快脉冲激光辐照金属薄膜热-力效应的模拟研究［J］. 光子学报, 2008, 37(11): 2172-2176.

WANG De-fei, QI Wen-zong, GUO Chun-feng. Simulation study of thermal and mechanical effect on metal film irradiated by ultra-fast laser pulse［J］. Acta Photonica Sinica, 2008, 37(11): 2172-2176.

[7] 吴英才, 顾铮. 激励表面等离子共振的金属薄膜最佳厚度分析［J］. 物理学报, 2008, 57(4): 2295-2299.

WU Ying-cai, GU Zheng. Research on the optimum thickness of metallic thin film utilized to excite surface plasmon resonance［J］. Acta Physica Sinica, 2008, 57(4): 2295-2299.

[8] 赵刚, 郝秋龙, 齐文宗, 等. 超短脉冲激光辐照下金属薄膜的热行为［J］. 光子学报, 2007, 36(1): 9-12.

ZHAO Gang, HAO Qiu-long, QI Wen-zong, et al. Thermal behavior of thin metal films irradiated by ultra-short pulse laser［J］. Acta Photonica Sinica, 2007, 36(1): 9-12.

[9] 范平, 赖国燕. 连续金属薄膜的电阻率研究［J］. 真空科学与技术, 1999, 19(6): 445-451.

FAN Ping, LAI Guo-yan. Calculation of metallic films resistivities［J］. Vacuum Science and Technology, 1999, 19(6): 445-451.

林育琼, 冯仕猛, 王坤霞, 顾俊, 刘少军. 金属薄膜厚度小于电子自由程对其光反射率的影响[J]. 光子学报, 2011, 40(2): 263. LIN Yu-qiong, FENG Shi-meng, WANG Kun-xia, GU Jun, LIU Shao-jun. Effects of Film Thickness Less than Electrical Mean Free Path on Reflectivity[J]. ACTA PHOTONICA SINICA, 2011, 40(2): 263.

金属薄膜厚度小于电子自由程对其光反射率的影响

关于本站 Cookie 的使用提示

全站搜索

金属薄膜厚度小于电子自由程对其光反射率的影响

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索