强激光与粒子束, 2008, 20 (4): 657, 网络出版: 2008-08-17   

衬底对原位氧化制备的ZnO薄膜结构和光学性质的影响

Effects of substrate on ZnO thin films prepared by in situ oxidation of Zn3N2
作者单位
1 湛江师范学院,物理科学与技术学院,湛江,524048
2 兰州大学,物理科学与技术学院,兰州,730000
摘要
采用射频反应溅射法在不同衬底上制备Zn3N2薄膜,然后对其原位氧化制备ZnO薄膜.利用X射线衍射分析(XRD)、扫描电子显微镜(SEM)和光致发光谱(PL)等表征技术研究了不同衬底对ZnO薄膜的结晶特性和发光性能的影响.XRD研究结果显示:Zn3N2薄膜在500 ℃原位氧化3 h后完全转变为ZnO薄膜,在玻璃和熔融石英衬底上制备的多晶ZnO薄膜无择优取向,而单晶硅(100)衬底上的多晶ZnO薄膜具有较好的沿(002)方向的择优取向.PL测试结果显示:硅和熔融石英衬底上的多晶ZnO薄膜发光性能良好,激子复合产生的紫外发光峰很强,且半高宽较窄,而来自于深能级发射的绿色发光峰很弱;而玻璃衬底上的多晶ZnO薄膜发光性能较差.
Abstract
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张军, 谢二庆, 谢毅柱, 付玉军, 邵乐喜. 衬底对原位氧化制备的ZnO薄膜结构和光学性质的影响[J]. 强激光与粒子束, 2008, 20(4): 657. 张军, 谢二庆, 谢毅柱, 付玉军, 邵乐喜. Effects of substrate on ZnO thin films prepared by in situ oxidation of Zn3N2[J]. High Power Laser and Particle Beams, 2008, 20(4): 657.

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