半导体光子学与技术, 2004, 10 (1): 35, 网络出版: 2011-08-15  

850nm Implant-confined VCSEL Temperature Characteristics

850nm Implant-confined VCSEL Temperature Characteristics
作者单位
Nation. Key Lab. of High Power Semiconductor Lasers, Changchun University of Sci. and Technol., Changchun 130022, CHN
引用该论文

LI Lin, ZHONG Jing-chang, LIU Wen-li, ZHAO Ying-jie, ZHANG Yong-ming, SU Wei. 850nm Implant-confined VCSEL Temperature Characteristics[J]. 半导体光子学与技术, 2004, 10(1): 35.

LI Lin, ZHONG Jing-chang, LIU Wen-li, ZHAO Ying-jie, ZHANG Yong-ming, SU Wei. 850nm Implant-confined VCSEL Temperature Characteristics[J]. Semiconductor Photonics and Technology, 2004, 10(1): 35.

参考文献

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[6] Van der Ziel J P, Chand N. High-temperature operation of 0. 98μm strained single quantum well In0. 2Ga0. 8As/GaAs lasers [J]. Appl. Phys. Lett., 1991, 58(13):1 437-1 439.

LI Lin, ZHONG Jing-chang, LIU Wen-li, ZHAO Ying-jie, ZHANG Yong-ming, SU Wei. 850nm Implant-confined VCSEL Temperature Characteristics[J]. 半导体光子学与技术, 2004, 10(1): 35. LI Lin, ZHONG Jing-chang, LIU Wen-li, ZHAO Ying-jie, ZHANG Yong-ming, SU Wei. 850nm Implant-confined VCSEL Temperature Characteristics[J]. Semiconductor Photonics and Technology, 2004, 10(1): 35.

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