激光与光电子学进展, 2007, 44 (4): 68, 网络出版: 2007-04-25
半导体激光化学刻蚀溶液浓度的电流变化选择法
Current Selection Method of Echant Chroma of Solution in Diode Laser Chemical Etching
摘要
提出了一种激光诱导液相腐蚀新方法——利用腐蚀电流特性和腐蚀图像均匀度相结合的方法,选择出适合的腐蚀溶液。该方法可以提高激光液相腐蚀的性能,解决腐蚀溶液选择的诸多难题,在特殊结构光电器件和光电集成中具有很好的应用前景。
Abstract
A new method of laser assisted wet etching is proposed, which depends on the etching current characteristic and uniformity of etching image to select the suitable etchant. With the proposed method, the performance of laser assisted wet etching is improved, and many problems existing in the selection of etchant can be solved. The new method shows a bright future in the fabrication of special-structured optoelectronic devices and optoelectronic integration.
羊恺, 刘娟秀, 补世荣, 罗正祥. 半导体激光化学刻蚀溶液浓度的电流变化选择法[J]. 激光与光电子学进展, 2007, 44(4): 68. 羊恺, 刘娟秀, 补世荣, 罗正祥. Current Selection Method of Echant Chroma of Solution in Diode Laser Chemical Etching[J]. Laser & Optoelectronics Progress, 2007, 44(4): 68.