半导体激光化学刻蚀溶液浓度的电流变化选择法
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羊恺, 刘娟秀, 补世荣, 罗正祥. 半导体激光化学刻蚀溶液浓度的电流变化选择法[J]. 激光与光电子学进展, 2007, 44(4): 68. 羊恺, 刘娟秀, 补世荣, 罗正祥. Current Selection Method of Echant Chroma of Solution in Diode Laser Chemical Etching[J]. Laser & Optoelectronics Progress, 2007, 44(4): 68.