Photonics Research, 2020, 8 (6): 06000799, Published Online: Apr. 30, 2020
Strain enhancement for a MoS2-on-GaN photodetector with an Al2O3 stress liner grown by atomic layer deposition Download: 834次
Basic Information
DOI: | 10.1364/PRJ.385885 |
中图分类号: | -- |
栏目: | Optoelectronics |
项目基金: | National Key Research and Development Program of China |
收稿日期: | Dec. 19, 2019 |
修改稿日期: | Feb. 29, 2020 |
网络出版日期: | Apr. 30, 2020 |
通讯作者: | Xinke Liu (xkliu@szu.edu.cn) |
备注: | -- |
Zhiwen Li, Jiangliu Luo, Shengqun Hu, Qiang Liu, Wenjie Yu, Youming Lu, Xinke Liu. Strain enhancement for a MoS2-on-GaN photodetector with an Al2O3 stress liner grown by atomic layer deposition[J]. Photonics Research, 2020, 8(6): 06000799.