改性剂对旋转法SiO<sub>2</sub>减反膜均匀性的影响

杨伟; 李海波; 张清华; 马红菊; 惠浩浩; 刘志超; 马平

强激光与粒子束, 2010, 22 (12): 2865, 网络出版: 2011-01-05

改性剂对旋转法SiO₂减反膜均匀性的影响

Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films

论文大纲

杨伟 ^*李海波张清华马红菊惠浩浩刘志超马平

作者单位

成都精密光学工程研究中心, 成都 610041

旋转涂膜条纹缺陷溶胶-凝胶减反膜含氟醇 spin coating striation defects sol-gel antireflective coating fluoroalkanol

摘要

分析了采用旋转涂膜法制备溶胶-凝胶SiO2减反膜过程中条纹缺陷产生的机理, 利用含氟醇类试剂对减反膜溶胶进行改性, 使溶胶链段柔顺性及流动性得到改善。在光学显微镜下对改性前后的膜层进行了对比和分析, 对膜层的表面形貌、表面粗糙度以及透射比等特性进行了表征。结果表明:溶胶改性之后的膜层未出现条纹缺陷, 表面粗糙度均方根值从4.55 nm下降到小于1.00 nm, 膜层表面质量有了较大提高;改性前后膜层的增透性能相当,在熔石英基片上制备的膜层峰值透射比为99.60%~99.89%, 膜层激光损伤阈值为21.0~25.3 J/cm2。

Abstract

The mechanism of radiative striations in spin-coated sol-gel silica antireflective films was analyzed. Several kinds of fluoroalkanol modified sols were prepared using the Stber method in order to improve the surface properties of the spin-coated films, especially the surface roughness. Surface morphologies of the films were observed using the Nomarski optical microscope and AFM, and quantitatively evaluated by surface roughness measurement. Results show that the striation defects are eliminated, and the surface roughness(RMS) of the coatings reduces from 4.55 nm to 1.00 nm after modification, while the antireflective properties show no apparent change. The films’ peak transmittance ranges from 99.60% to 99.89% with the laser damage threshold of 21.0 to 25.3 J/cm2.

参考文献

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杨伟, 李海波, 张清华, 马红菊, 惠浩浩, 刘志超, 马平. 改性剂对旋转法SiO₂减反膜均匀性的影响[J]. 强激光与粒子束, 2010, 22(12): 2865. Yang Wei, Li Haibo, Zhang Qinghua, Ma Hongju, Hui Haohao, Liu Zhichao, Ma Ping. Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films[J]. High Power Laser and Particle Beams, 2010, 22(12): 2865.

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