采用发射光谱和朗缪尔探针诊断低温低压氢等离子体
[1] 吴卫东,罗江山,黄勇,等.H2及H+对CxH1-x薄膜表面状态的影响[J].强激光与离子束,2000,12(5):593-596.(Wu W D,Luo J S,Huang Y,et al.The effect of H2 and H+ on CxH1-x film surface state.High Power Laser and Particle Beams,2000,12(5):593-596)
[2] Ma J,Pu Y K.Tuning the electron temperature of a nitrogen plasma by adding helium and argon[J].Physics of Plasmas,2003,10(10):4118-4122.
[3] Harilal S S,Issac R C,Bindhu C V,et al.Optical emission studies of C2 species in laser-produced plasma from carbon[J].Journal of Physics D:Applied Physics,1997,30:1703-1709.
[5] Godyak V A,Piejak R B,Alexandrovich B M.Probe diagnostics of non-Maxwellian plasmas[J].Journal of Applied Physics,1993,73(8):3657-3663.
[6] Andruczyk D,Tarrant R N,James B W,et al.Langmuir probe study of a titanium pulsed filtered cathodic arc discharge[J].Plasma Sources Sci Technol,2006,15:533-537.
[7] Godyak V A,Piejak R B,Alexandrovich B M.Measurements of electron energy distribution in low-pressure RF discharges[J].Plasma Sources Sci Technol,1992,1:36-58.
[8] Sudit I D,Chen F F.RF compensated probes for high-density discharges[J].Plasma Sources Sci Technol,1994,3:162-168.
[9] 罗利霞,吴卫东,孙卫国,等.低压甲烷等离子体发射光谱诊断[J].真空科学与技术,2007,27(3):203-207.(Luo L X,Wu W D,Sun W G,et al.Optical emission spectroscopy diagnosis of the low-pressure methane plasma.Journal Vacuum Science and Technology,2007,27(3):203-207)
[10] Gathen V S,Dbele H F.Critical comparison of emission spectroscopic determination of dissociation in hydrogen RF discharges[J].Plasma Chem Plasma Proc,1996,16:461-486.
[12] 牛田野,曹金祥,刘磊,等.低温氩等离子体中的单探针和发射光谱诊断技术[J].物理学报,2007,56(4):2330-2336.(Niu T Y,Cao J X,Liu L,et al.The techniques of single probe and emission spectroscopy diagnostics in low temperature argon plasmas.Acta Physica Sinica,2007,56(4):2330-2336)
[13] Godyak V A,Kolobov V I.Effect of collisionless heating on electron energy distribution in an inductively coupled plasma[J].Phy Rev Lett,1998,81:369-372.
[14] 于威,王保柱,杨彦斌,等.螺旋波等离子体化学气相沉积纳米硅薄膜的光学发射谱研究[J].物理学报,2005,54(5):2394-2398.(Yu W,Wang B Z,Yang Y B,et al.Optical emission diagnosis of helicon-wave-plasma-enhanced chemical vapor deposition of nanocrystalline silicon.Acta Physica Sinica,2005,54(5):2394-2398)
[15] 赵化侨.等离体化学与工艺[M].合肥:中国科学技术大学出版社,1993:9-55.(Zhao H Q,Plasma chemistry and processing.Hefei:University of Science and Technology of China Press,1993:9-55)
[16] Behringer K,Fantz U.The influence of opacity on hydrogen excited-state population and applications to low-temperature plasmas[J].New J Phys,2000,2(23):1-19.
[17] Fujita F,Yamazaki H.Determination of electron energy distribution function of plasmas by digital processing from Langmuir probe characteristic[J].Jpn J Appl Phys,1990,29(10):2139-2144.
[18] Degeling A W,Jung C O,Boswell R W,et al.Plasma production from helicon waves[J].Physics of Plasmas,1996,3(7):2788-2796.
朱永红, 吴卫东, 陆晓曼, 唐永建, 孙卫国. 采用发射光谱和朗缪尔探针诊断低温低压氢等离子体[J]. 强激光与粒子束, 2008, 20(4): 601. 朱永红, 吴卫东, 陆晓曼, 唐永建, 孙卫国. Diagnosis of hydrogen plasmas at low temperature and low pressure by spectroscopy and Langmuir probe[J]. High Power Laser and Particle Beams, 2008, 20(4): 601.