光学学报, 1996, 16 (7): 998, 网络出版: 2006-12-04
紫外激光SiO2减反膜的制备
Preparation of Silica Antireflective Coating for UV-Laser
摘要
介绍溶胶-凝胶法制备SiO2减反膜的溶液配制,基片清洗和膜层制备过程,利用正硅酸乙酯的碱性催化水解,通过浸入移液法在石英透镜的表面涂敷一层多孔SiO2减反膜,涂膜后石英透镜的透过率在350um波长处达到98.0%以上。
Abstract
The preparation of silica antireflective coating through sol- gel process is discussed involving the composition of coating solution, cleaning of substrate and coating process. The porous silica film can be deposited on the silica lens by dipping from the solution, with the base catalyzed hydrolyzation of tetraeathyl silicate (TEOS) in anhydrous ethyl alcohol. The transmission of coating on the silica lens is 98.3 % at 350nm, and the peak transmission is over 99.0%.
参考文献
张林, 杜凯, 周兰, 涂海燕. 紫外激光SiO2减反膜的制备[J]. 光学学报, 1996, 16(7): 998. 张林, 杜凯, 周兰, 涂海燕. Preparation of Silica Antireflective Coating for UV-Laser[J]. Acta Optica Sinica, 1996, 16(7): 998.