模拟光刻中双层衰减相移接触孔衍射的理论公式
杨亮, 李艳秋, 刘克, 刘丽辉. 模拟光刻中双层衰减相移接触孔衍射的理论公式[J]. 光学技术, 2013, 39(5): 413.
YANG Liang, LI Yanqiu, LIU Ke, LIU Lihui. Formulation for simulating the bi-layer attenuated phase shift contact hole diffraction in lithography[J]. Optical Technique, 2013, 39(5): 413.
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杨亮, 李艳秋, 刘克, 刘丽辉. 模拟光刻中双层衰减相移接触孔衍射的理论公式[J]. 光学技术, 2013, 39(5): 413. YANG Liang, LI Yanqiu, LIU Ke, LIU Lihui. Formulation for simulating the bi-layer attenuated phase shift contact hole diffraction in lithography[J]. Optical Technique, 2013, 39(5): 413.
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