强激光与粒子束, 2015, 27 (11): 112010, 网络出版: 2015-11-30
光学元件兆声辅助化学刻蚀工艺参数优化
Process parameters optimization for fused silica optics by megasonic assisted chemical etching
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王洪祥, 李成福, 周岩, 袁志刚, 徐曦, 钟波. 光学元件兆声辅助化学刻蚀工艺参数优化[J]. 强激光与粒子束, 2015, 27(11): 112010. Wang Hongxiang, Li Chengfu, Zhou Yan, Yuan Zhigang, Xu Xi, Zhong Bo. Process parameters optimization for fused silica optics by megasonic assisted chemical etching[J]. High Power Laser and Particle Beams, 2015, 27(11): 112010.