脉冲激光作用单晶硅的等离子体光谱分析
刘丽炜, 曲璐, 谭勇, 张喜和. 脉冲激光作用单晶硅的等离子体光谱分析[J]. 强激光与粒子束, 2010, 22(8): 1815.
Liu Liwei, Qu Lu, Tan Yong, Zhang Xihe. Plasma spectrum analysis of monocrystalline silicon irradiated by pulsed laser[J]. High Power Laser and Particle Beams, 2010, 22(8): 1815.
[1] 李静,林长贺,李胜利, 等.激光等离子体光谱测量影响因素分析[J].光谱学与光谱分析, 2005, 25(12):1905-1907.(Li Jing, Lin Changhe, Li Shengli, et al. Infection factor analysis of laser plasma spectrum measure. Spectroscopy and Spectrum Analysis, 2005, 25(12):1905-1907)
[3] Ready J F. Effect of high power laser radition[M]. NewYork: Academic, 1971.
[4] 辛仁轩.等离子体发射光谱分析[M].北京:化学工业出版社, 2005.(Xin Renxuan. Analysis of plasma emission spectrum. Beijing: Chemical Industry Press, 2005)
[5] 邱德仁.原子光谱分析[M].上海:复旦大学出版社, 2002.(Qiu Deren. Analysis of atom spectrum. Shanghai: Fudan University Press, 2002)
[6] 张令清, 韩申生, 徐至展, 等.离子体谱线线型研究与谱线强度测量[J].强激光与粒子束, 1995, 7(2):239-243.(Zhang Lingqing, Han Shensheng, Xu Zhizhan, et al. Plasma spectrum linetype analysis and spectrum intensity measure. High Power Laser and Particle Beams, 1995, 7(2):239-243)
[7] 陆建, 倪晓武, 贺安之.激光与材料相互作用物理学[M].北京:机械工业出版社, 1996.(Lu Jian, Ni Xiaowu, He Anzhi. Physics of interaction between laser and material. Beijing: China Mechane Press, 1996)
刘丽炜, 曲璐, 谭勇, 张喜和. 脉冲激光作用单晶硅的等离子体光谱分析[J]. 强激光与粒子束, 2010, 22(8): 1815. Liu Liwei, Qu Lu, Tan Yong, Zhang Xihe. Plasma spectrum analysis of monocrystalline silicon irradiated by pulsed laser[J]. High Power Laser and Particle Beams, 2010, 22(8): 1815.