穆勒矩阵成像椭偏仪误差源的简化分析方法 下载: 964次
孟泽江, 李思坤, 王向朝, 步扬, 戴凤钊, 杨朝兴. 穆勒矩阵成像椭偏仪误差源的简化分析方法[J]. 光学学报, 2019, 39(9): 0911002.
Zejiang Meng, Sikun Li, Xiangzhao Wang, Yang Bu, Fengzhao Dai, Chaoxing Yang. Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter[J]. Acta Optica Sinica, 2019, 39(9): 0911002.
[5] Kye J. McIntyre G, Norihiro Y, et al. Polarization aberration analysis in optical lithography systems[J]. Proceedings of SPIE, 2006, 6154: 61540E.
[6] Totzeck M, Graupner P, Heil T, et al. How to describe polarization influence on imaging[J]. Proceedings of SPIE, 2004, 5754: 23-37.
[7] Pezzaniti J L, Chipman R A. Mueller matrix imaging polarimetry[J]. Optical Engineering, 1995, 34(6): 1558-1568.
[9] Bhattacharyya K. Serrano-García D I, Otani Y. Accuracy enhancement of dual rotating mueller matrix imaging polarimeter by diattenuation and retardance error calibration approach[J]. Optics Communications, 2017, 392: 48-53.
[15] Meng Z J, Li S K, Wang X Z, et al. Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources[J]. Optics Express, 2019, 27(4): 4629-4647.
孟泽江, 李思坤, 王向朝, 步扬, 戴凤钊, 杨朝兴. 穆勒矩阵成像椭偏仪误差源的简化分析方法[J]. 光学学报, 2019, 39(9): 0911002. Zejiang Meng, Sikun Li, Xiangzhao Wang, Yang Bu, Fengzhao Dai, Chaoxing Yang. Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter[J]. Acta Optica Sinica, 2019, 39(9): 0911002.