采用脉冲激光沉积（PLD）法在不同氧分压下于LaAlO3 (100)基片上成功制备了SrTiO3（STO）薄膜。通过测试，表征了薄膜的微观结构、表面形貌和光学特性。研究表明，对于利用PLD法制备STO薄膜，氧分压是重要的工艺参数。随着氧分压的降低，薄膜的结晶性变好，并发生由立方晶系到四方晶系的形变;氧分压升高，薄膜晶粒尺寸变大、数目变少，薄膜的厚度减小。薄膜在400~2500 nm的可见光和红外波段呈现较低的光学吸收。在5，10和15 Pa氧压下制备的STO薄膜的能隙宽度分别约为3.84，4.13和4.05 eV。这为STO薄膜进一步的制备与分析提供了良好的实验数据支持。

SrTiO3(STO) thin films are manufactured on LaAlO3 (100) substrates by pulsed laser deposition (PLD) with different partial pressures of oxygen. The films′ microstructure, surface morphology and optical characteristics are characterized. In accordance with the above results, the partial pressures of oxygen is an important process parameter for the preparation of STO thin films by PLD. With decreasing partial pressure of oxygen, the crystallinity of the thin films has ameliorated, and the structure changes from cubic to tetragonal. Film grain size gradually increases, film grain number and film thickness decrease when the partial pressure of oxygen rises. The STO films present a low optical absorption in the 400~2500 nm wavelength range. The band gap energy of the STO films deposited at 5, 10 and 15 Pa are 3.84, 4.13 and 4.05 eV, respectively. This can provide good experimental data to the further analysis of STO thin films.