光子学报, 2010, 39 (9): 1543, 网络出版: 2010-11-04  

光溅射镀膜均匀性的优化模拟

Optimal Simulation for the Thickness Uniformity of the Film Deposited by Pulse Laser Sputtering
作者单位
西北核技术研究所,西安 710024
引用该论文

王晟, 叶景峰, 刘晶儒, 白婷, 叶锡生, 王立君. 光溅射镀膜均匀性的优化模拟[J]. 光子学报, 2010, 39(9): 1543.

WANG Sheng, YE Jing-feng, LIU Jing-ru, BAI Ting, YE Xi-sheng, WANG Li-jun. Optimal Simulation for the Thickness Uniformity of the Film Deposited by Pulse Laser Sputtering[J]. ACTA PHOTONICA SINICA, 2010, 39(9): 1543.

参考文献

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    LIU Jing-ru, BAI Ting, LI Tie-jun, et al. Study on pulsed excimer laser deposited films[J].High Power Laser and Particle Beams, 2002, 14(5): 646-650.

[2] 姚东升, 刘晶儒, 王丽戈, 等. 超短脉冲准分子激光淀积类金刚石薄膜的实验研究[J]. 光学学报, 1999, 19(2): 270-276.

    YAO Dong-sheng, LIU Jing-ru, WANG Li-ge, et al. Deposition of DLC film by ultrashort pulsed excimer laser[J]. Acta Optica Sinica, 1999, 19(2): 270-276.

[3] 白婷,叶景峰,刘晶儒, 等. 利用脉冲准分子激光在ZnS上沉积类金刚石薄膜[J]. 中国激光, 2007, 34(7): 992-997.

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[4] 李铁军,刘晶儒,王丽戈,等.利用脉冲激基分子激光制备大尺寸类金刚石薄膜及其均匀性分析[J].光子学报,1999,28(5): 1080-1085.

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王晟, 叶景峰, 刘晶儒, 白婷, 叶锡生, 王立君. 光溅射镀膜均匀性的优化模拟[J]. 光子学报, 2010, 39(9): 1543. WANG Sheng, YE Jing-feng, LIU Jing-ru, BAI Ting, YE Xi-sheng, WANG Li-jun. Optimal Simulation for the Thickness Uniformity of the Film Deposited by Pulse Laser Sputtering[J]. ACTA PHOTONICA SINICA, 2010, 39(9): 1543.

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