光子学报, 2018, 47 (12): 1231003, 网络出版: 2019-01-10
掺Ge氧化硅薄膜波导制备工艺与应力研究
Preparation Process and Stress Study of Ge-doped Silica Film Waveguide
补充材料
孙庆雨, 孙喆禹, 邢文超, 孙德贵. 掺Ge氧化硅薄膜波导制备工艺与应力研究[J]. 光子学报, 2018, 47(12): 1231003. SUN Qing-yu, SUN Zhe-yu, XING Wen-chao, SUN De-gui. Preparation Process and Stress Study of Ge-doped Silica Film Waveguide[J]. ACTA PHOTONICA SINICA, 2018, 47(12): 1231003.