实际高数值孔径光刻系统的偏振分析

罗红妹; 岑兆丰; 李晓彤; 张鲁薇; 张跃骞

doi:doi:10.3788/aos201333.1122002

光学学报, 2013, 33 (11): 1122002, 网络出版: 2013-09-17

实际高数值孔径光刻系统的偏振分析

Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei

论文大纲

罗红妹 ^*岑兆丰李晓彤张鲁薇张跃骞

作者单位

浙江大学光电信息工程学系, 浙江杭州 310027

摘要

在光学系统偏振传输理论的基础上，对一高数值孔径（NA）的透射式光刻系统进行了偏振分析，分析中考虑了系统的实际特性现有工艺水平可制备的增透膜、薄膜和基底材料的吸收作用以及偏振照明，以增加分析结果的可靠性。通过计算系统各光学界面的透射率、反射率、吸收率及二次衰减值等偏振参数，得到镀膜、吸收作用以及不同偏振照明对系统传输性能和成像性能的影响。结果表明镀膜能有效提高该光刻系统的性能及稳定性，并可以将不同偏振照明对该系统性能的影响减小至可忽略的水平；同时，显著的基底吸收作用是该系统能量损失的主因，但吸收引入的偏振作用相对总体而言较小。

Abstract

Based on the polarization transmission theory in optical system, the polarization analysis of a real high numerical aperture (NA) refractive optical lithography system is made, where the anti-reflection coating within current technology, the absorption in coating and base, and polarized illumination are taken into account to obtain a higher-reliability result. Several polarization parameters at every optical interface are calculated, such as transmission, reflection, absorptance and diattenuation, to achieve the effects of anti-reflection coating, absorption of the materials and polarized illumination on transmission performance and imaging performance. The results reveal that the anti-reflection coating can dramatically enhance the performance and stability of this sample system, while reducing the effects of varied polarized illumination to a negligible degree. Besides, the dramatic absorption in the base material plays a main role in the intensity loss, and the absorption has a small contribution to overall polarization effects.

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罗红妹, 岑兆丰, 李晓彤, 张鲁薇, 张跃骞. 实际高数值孔径光刻系统的偏振分析[J]. 光学学报, 2013, 33(11): 1122002. 罗红妹, 岑兆丰, 李晓彤, 张鲁薇, 张跃骞. Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei[J]. Acta Optica Sinica, 2013, 33(11): 1122002.

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