激光量热法测量光学薄膜微弱吸收

李斌成; 熊胜明; Holger Blaschke; Detlev Ristau

中国激光, 2006, 33 (6): 823, 网络出版: 2006-06-13

激光量热法测量光学薄膜微弱吸收

Measuring Weak Absorptance of Optical Thin Films with Laser Calorimetric Technique

论文大纲

李斌成 ^1,*熊胜明 ¹Holger Blaschke ²Detlev Ristau ²

作者单位

¹ 中国科学院光电技术研究所, 四川成都 610041

² 汉诺威激光中心, 德国汉诺威 30419

测量技术微弱吸收激光量热法光学薄膜 measurement technique weak absorptance laser calorimetry optical thin films

摘要

按照国际标准ISO 11551研制了用于测量光学薄膜微弱吸收的激光量热装置。典型情况下吸收测量灵敏度优于10-6,测量误差估计为10%左右。在1064 nm波长测量1 mm厚石英玻璃基板的绝对吸收为3.4×10-6,测量灵敏度达到1.5×10-7。测量了不同膜层设计、不同使用角度、不同镀膜技术镀制的全介质高反膜样品;使用离子束溅射(IBS)技术镀制的Ta2O5/SiO2多层0°反射镜的吸收仅为1.08×10-5,而使用离子束辅助沉积(IAD)技术镀制的HfO2/SiO2多层45°反射镜的吸收测量值为6.83×10-5。

Abstract

A laser calorimeter in compliance with ISO 11551 was developed to measure the absolute absorptance of optical thin films. Under a typical condition the absorptance sensitivity of the calorimeter was better than 10-6 and the measurement error was estimated to be ～10%. For an uncoated fused silica substrate with 1-mm thickness, the measured absorptance was 3.4×10-6 and the sensitivity was ～1.5×10-7. The laser calorimeter was employed to measure the absorptance of highly reflective dielectric coatings prepared by two different coating techniques. The absolute absorptance of a 0° Ta2O5/SiO2 multilayer mirror prepared by the ion beam sputtering (IBS) technique was as low as 1.08×10-5, and the absorptance of a 45° HfO2/SiO2 multilayer mirror prepared by the ion-assisted deposition (IAD) technique was 6.83×10-5, respectively.

参考文献

[1] . Welsch, D. Ristau. Photothermal measurement on optical thin films[J]. Appl. Opt., 1995, 34(31): 7239-7253.

[2] ISO 11551: 2003(E), Test method for absorptance of optical laser components [S]. International Organization for Standardization, Geneva, Switzerland, 2003

[3] . Development of a thermographic laser calorimeter[J]. Appl. Opt., 1986, 25(24): 4571-4578.

[4] U. Willamowski, T. Gross, D. Ristau et al.. Calorimetric measurement of optical absorption and transmissivity with sub-ppm sensitivity [C]. SPIE, 1996, 2775:148～158

[5] K. Mann, G. Eckert, C. Gerling et al.. Characterization of DUV and VUV optical components [C]. SPIE, 2002, 4691:1742～1752

[6] . Welsch. Measuring the absolute absorptance of optical laser components[J]. Appl. Opt., 1998, 37(36): 8362-8370.

[7] H. Blaschke, M. Jupé, D. Ristau. Absorptance measurements for the DUV spectral range by laser calorimetry [C]. SPIE, 2003, 4932:467～474

[8] Hu Haiyang, Fan Zhengxiu, Zhao Qiang. Measuring weak absorptance of thin film coatings by surface thermal lensing technique [J]. Acta Optica Sinica, 2001, 21(2):150～154
胡海洋,范正修,赵强. 表面热透镜技术探测光学薄膜的微弱吸收[J]. 光学学报, 2001, 21(2):150～154

[9] Wang Yingjian, Hu Haiyang, Li Qingguo et al.. Study of weak absorption of the thin films coated on the Si plates [J]. Chinese J. Lasers, 2001, A28(10):937～940
王英剑,胡海洋,李庆国等. 高反射硅镜弱吸收研究[J]. 中国激光, 2001, A28(10):937～940

李斌成, 熊胜明, , . 激光量热法测量光学薄膜微弱吸收[J]. 中国激光, 2006, 33(6): 823. 李斌成, 熊胜明, Holger Blaschke, Detlev Ristau. Measuring Weak Absorptance of Optical Thin Films with Laser Calorimetric Technique[J]. Chinese Journal of Lasers, 2006, 33(6): 823.

激光量热法测量光学薄膜微弱吸收

关于本站 Cookie 的使用提示

全站搜索

激光量热法测量光学薄膜微弱吸收

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索