光学学报, 2006, 26 (10): 1565, 网络出版: 2006-10-31  

消除半导体激光诱导腐蚀晶向影响的两步腐蚀新方法

New TwoStep Etching Method Wiping off Crystal Tropism Influence in Laser-Induced Wet Chemical Etching
作者单位
电子科技大学光电信息学院, 成都 610054
摘要
提出了一种消除激光化学诱导液相腐蚀晶体取向影响的新方法——两步腐蚀法。激光化学液相两步腐蚀法实质上是加长非晶向方向图形的腐蚀时间,保证与晶向方向腐蚀程度一致。实验结果表明,晶体取向对激光化学诱导液相腐蚀图形有较大的影响;两步腐蚀法可以有效地消除晶体取向影响,得到需要的图形;与国内外普遍采用的表面抗蚀膜掩蔽和激光光强分布调节等方法相比,具有可以处理内部晶向影响,操作简单,设备要求低等特点,两步腐蚀法可以有效地克服常规方法的诸多弊端,达到消除晶向影响的目的,在特殊结构光电器件和光电集成中具有广泛的应用前景。
Abstract
A new method, laserassisted wet twostep etching, which can wipe off the crystal tropism influence in laser induced wetchemical etching is proposed. The essential of this method is to lengthen the etching time in noncrystaltropism direction and assure the same etching degree as that in the crystaltropism direction. Theoretical analysis and experimental result show that the crystal tropism influences the etched image greatly; and the twostep method can wipe off the crystal tropism influence effectively; and also, compared with the adopted normally surface mask film and laser intensity distributing accommodation, the twostep etching method can deal with the inside crystal tropism influence, operate easily and the requirement for equipment is low. The laserassisted wet twostep etching can overcome the disadvantages of conventional ones, and wipe off the crystal tropism influence and is useful in the fabrication of specialstructured optoelectronic devices and optoelectronic integration.
参考文献

[1] Kawagachi Yoshizo, Sato Tadatake, Narazaki Aiko et al.. Etching a microtrench with a maximum aspect ratio of 60 on silica glass by laserinduced backside wet etching[J]. Japanese J. Applied Physics, Part 2: Letters, 2005, 44(1~7): L176~L178

[2] L. W. Hrubesh, M. A. Norton, W. A. Molander et al.. Chemical etch effects on laserinduced surface damage growth in fused silica[C]. Proc. SPIE, 2001, 4347: 553~559

[3] Elin Steinsland, Terje Finstad, Anders Hanneberg et al.. Etch rates of (100), (111) and (110) singlecrystal silicon in TMAH measured in situ by laser reflectance interferometry[J]. Sensors and Actuators, A: Physical, 2000, 86(1~2): 73~80

[4] T. Oishi, M. Goto, Y. Pihosh et al.. Silicon microstructure fabricated by laser micropatterning method combined with wet etching process[J]. Appl. Sur. Sci., 2005, 241(1~2): 223~226

[5] . J, Choquette Kent. D et al.. Etching depth dependence of the effective refractive index in twodimensional photoniccrystalpatterned verticalcavity surfaceemitting laser structures[J]. Appl. Phys. Lett., 2003, 82(9): 1344-1346.

[6] . . Influence of Er∶YAG laser surface treatment and primer application methods on microtensile bond strength selfetching systems[J]. Photomedicine and Laser Surgery, 2005, 23(3): 304-312.

[7] . Mailis, G. W. Ross, L. Reekie et al.. Fabrication of surface relief gratings on lithium niobate by combined UV laser and wet etching[J]. Electron. Lett., 2000, 36(21): 1801-1803.

[8] Liu Lin, Zhao Suying, Liu Juanxiu et al.. Laser etching holes diameter controlling and transverse etching[J]. J. Optoelectronics Laser, 2005, 16(7): 841~844 (in Chinese)
刘霖,赵素英,刘娟秀 等. 激光化学腐蚀孔直径控制与横向腐蚀特性[J]. 光电子激光, 2005, 16(7): 841~844

[9] Liu Lin, Ye Yutang, Liu Juanxiu et al.. A new orderselective etching method in laser induced wetchemical etching[J]. Chin. J. Lasers, 2006, 33(1): 49~52 (in Chinese)
刘霖,叶玉堂,刘娟秀 等. 激光化学液相次序选择腐蚀新方法[J]. 中国激光, 2006, 33(1): 49~52

[10] Zhang Song, Zhang Chunhua, Wen Xiaozhong et al.. Cavitation erosion performance of laser surface cladding MMC of Si3N4 on AA6061 alumium alloy[J]. Chin. J. Lasers, 2003, 30(2): 185~188 (in Chinese)
张松,张春华,文效忠 等. AA6061Al合金表面Si3N4激光熔覆层的空泡腐蚀性能张[J]. 中国激光, 2003, 30(2): 185~188 (in Chinese)

[11] Li Changan, Liu Zhanhui, Sun Yongkang et al.. Fabrication of optical fiber probes by dynamic chemical etching based on siphon principle[J]. Acta Optica Sinica, 2004, 24(11): 1441~1444
李昌安,刘战辉, 孙永康 等. 虹吸动态化学腐蚀法制备近场光学显微镜光纤探针的研究[J]. 光学学报, 2004, 24(11): 1441~1444

刘霖, 叶玉堂, 吴云峰, 陈镇龙, 范超, 王昱琳. 消除半导体激光诱导腐蚀晶向影响的两步腐蚀新方法[J]. 光学学报, 2006, 26(10): 1565. 刘霖, 叶玉堂, 吴云峰, 陈镇龙, 范超, 王昱琳. New TwoStep Etching Method Wiping off Crystal Tropism Influence in Laser-Induced Wet Chemical Etching[J]. Acta Optica Sinica, 2006, 26(10): 1565.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!