超大数值孔径光刻中掩模保护膜优化及偏振像差研究
[1] . Optical lithography——a historical perspective[J]. Comptes Rendus Physique, 2006, 7(8): 844-857.
[2] 廖飞红, 李小平, 陈学东 等. 调焦调平探测光斑位置误差对测量准确度影响的研究[J]. 光学学报, 2010, 30(4): 1041~1045
[3] 马斌, 李林, 常军 等. 高分辨率折射式投影光刻物镜的研究[J]. 光学学报, 2009, 29(s2): 211~215
[4] 杨雄, 邢廷文. 极紫外投影光刻物镜设计[J]. 光学学报, 2009, 29(9): 2520~2523
[5] 周远, 李艳秋. 双液体层消色差氩氟浸没干涉光刻性能分析[J]. 中国激光, 2010, 37(12): 3007~3012
[6] D. G. Flagello, B. Arnold. Optical lithography for nanotechnology[C]. SPIE, 2006, 6327: 63270D
[7] P. Graeupner, R. B. Garreis, A. Goehnermeier et al.. Impact of wavefront errors on low k1 processes at extremely high NA[C]. SPIE, 2003, 5040: 119~130
[8] T. A. Brunner. Impact of lens aberrations on optical lithography[J]. IBM J. Res. Develop., 1997, 41(1-2): 57~67
[9] J. Kye, G. Mcintyre, Y. Norihiro et al.. Polarization aberration analysis in optical lithography systems[C]. SPIE, 2006, 6154: 61511~61540
[10] . R. Mc, J. Kye, H. Levinson et al.. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations[J]. Journal of Microlithography, Microfabrication, and Microsystems, 2006, 5(3): 33001.
[11] M. Totzeck, P. G. Totzeck, T. Heil et al.. How to describe polarization influence on imaging (Invited Paper)[C]. SPIE, 2004, 5754: 23~37
[12] K. Bubke, B. Alles, E. Cotte et al.. Pellicle induced aberration and apodization in hyper NA optical lithography[C]. SPIE, 2006, 6283: 628312
[13] . Yu. Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principlies[J]. Journal of Microlithography, Microfabrication, and Microsystems, 2005, 4(4): 043003.
[14] R. A. Chipman. Polarization Aberrations[D]. Ann Arbor MI: University of Arizona, 1987, 9
周远, 李艳秋, 刘光灿. 超大数值孔径光刻中掩模保护膜优化及偏振像差研究[J]. 中国激光, 2011, 38(4): 0407001. Zhou Yuan, Li Yanqiu, Liu Guangcan. Study on Pellicle Optimization and Polarization Aberration Induced by Pellicle in Hyper Numerical Aperture Lithography[J]. Chinese Journal of Lasers, 2011, 38(4): 0407001.