[1] Liu Y, Liu S, Zhang X. Fabrication of three-dimensional photonic crystals with two-beam holographic lithography[J]. Applied Optics, 2006, 45(3): 480-483.
[2] Lin Y, Harb A, Lozano K, et al. Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element[J]. Optics Express, 2009, 17(19): 16625-16631.
[3] Burrow G M, Gaylord T K. Multi-beam interference advances and applications: nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures[J]. Micromachines, 2011, 2(2): 221-257.
[4] Krishnamoorthy A, Chanda K, Murarka S P, et al. Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization[J]. Applied Physics Letters, 2001, 78(17): 2467-2469.
[5] Kruger J, Plass R, Cevey L, et al. High efficiency solid-state photovoltaic device due to inhibition of interface charge recombination[J]. Applied Physics Letters, 2001, 79(13): 2085-2087.
[6] Xu D, Chen K P, Ohlinger K, et al. Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure[J]. Nanotechnology, 2011, 22(3): 035303.
[7] Goldenberg L M, Lisinetskii V, Gritsai Y, et al. Second order DFB lasing using reusable grating inscribed in azobenzene-containing material[J]. Optical Materials Express, 2012, 2(1): 11-19.
[8] Ebendorff-Heidepriem H, Ehrt D. Formation and UV absorption of cerium, europium and terbium ions in different valencies in glasses[J]. Optical Materials, 2000, 15(1): 7-25.
[9] Goldenberg L M, Gritsai Y, Kulikovska O, et al. Three-dimensional planarized diffraction structures based on surface relief gratings in azobenzene materials[J]. Optics Letters, 2008, 33(12): 1309-1311.
[10] 周兴平, 疏静, 卢斌杰, 等. 基于三角晶格光子晶体谐振腔的双通道解波分复用器[J]. 光学学报, 2013, 33(1): 0123001.
Zhou X P, Shu J, Lu B J, et al. Two-wavelength division demultiplexer based on triangular lattice photonic crystal resonant cavity[J]. Acta Optica Sinica, 2013, 33(1): 0123001.
[11] Isakov D S, Kundikova N D, Miklyaev Y V. Interference lithography for the synthesis of three-dimensional lattices in SU-8: interrelation between porosity, an exposure dose and a grating period[J]. Optical Materials, 2015, 47: 473-477.
[12] 熊平新, 贾鑫, 贾天卿, 等. 三光束飞秒激光干涉在GaP, ZnSe表面诱导二维复合纳米-微米周期结构[J]. 物理学报, 2010, 59(1): 311-316.
Xiong P X, Jia X, Jia T Q, et al. Two-dimensional complex nano-micro patterning on GaP and ZnSe surface created by the interference of three femtosecond laser beams[J]. Acta Physica Sinica, 2010, 59(1): 311-316.
[13] 杨宏道, 李晓红, 李国强, 等. 1064 nm纳秒脉冲激光诱导硅表面微结构研究[J]. 物理学报, 2011, 60(2): 027901.
Yang H D, Li X H, Li G Q, et al. Silicon surface microstructures created by 1064 nm Nd∶YAG nanosecond laser[J]. Acta Physica Sinica, 2011, 60(2): 027901.
[14] 李晨, 程光华, Stoian R. 飞秒激光诱导金属钨表面周期性自组织结构的研究[J]. 光学学报, 2016, 36(5): 0532001.
Li C, Cheng G H, Stoian R. Investigation of femtosecond lase-induced periodic surface structure ontungsten[J]. Acta Optica Sinica, 2016, 36(5): 0532001.
[15] 钟敏霖, 李焱. “超快激光加工与微纳制造”专题前言[J]. 中国激光, 2017, 44(1): 0102000.
Zhong M L, Li Y. Special introduction: ultra-fast laser processing and micro-nano manufacturing[J]. Chinese Journal of Laser, 2017, 44(1): 0102000.
[16] 张锦, 冯伯儒, 郭永康. 四激光束干涉光刻制造纳米级孔阵的理论分析[J]. 光子学报, 2003, 32(4): 398-401.
Zhang J, Feng B R, Guo Y K. Theoretical analysis for fabricating nanometer hole array with 4 laser beams interferencelithography[J]. Acta Photonica Sinica, 2003, 32(4): 398-401.
[17] 陈小军, 张自丽, 葛辉良. 四光束干涉单次曝光构造含平面缺陷三维周期性微纳结构[J]. 物理学报, 2012, 61(17): 174211.
Cheng X J, Zhang Z L, Ge H L. Fabricating three-dimensional periodic micro-structure with planar defects via a single exposure[J]. Acta Physica Sinica, 2012, 61(17): 174211.
[18] 李艳, 陈辉, 代克杰. 飞秒四光束干涉技术加工石墨烯纳米网[J]. 微纳电子技术, 2013, 50(10): 662-666.
Li Y, Chen H, Dai K J. Fabrication of graphene nanomeshes by the femtosecond four-beam interference technique[J]. Micronanoelectronic Technology, 2013, 50(10): 662-666.
[19] 张锦, 冯伯儒, 郭永康. 双光束双曝光与四光束单曝光干涉光刻方法的比较[J]. 光电工程, 2005, 32(12): 21-24.
Zhang J, Feng B R, Guo Y K. Comparison between double exposure with two laser beams interference and single exposure with four laser beams[J]. Opto-Electronic Engineering, 2005, 32(12): 21-24.
[20] 梁文耀, 何锐斌, 林灯荣, 等. 光束偏振对三角光子晶体全息制作影响的仿真研究[J]. 激光与光电子学进展, 2016, 53(9): 091601.
Liang W Y, He R B, Lin D R, et al. Influence of beam polarizations on holographic fabrication of triangular photonic crystals[J]. Laser & Optoelectronics Progress, 2016, 53(9): 091601.
[21] 吴晓. 偏振态对三光束激光干涉分布的影响[J]. 光学学报, 2015, 35(10): 1012002.
Wu X. Influence study of polarization on three-beam interference[J]. Acta Optica Sinica, 2015, 35(10): 1012002.
[22] Wang D, Wang Z, Zhang Z, et al. Effects of polarization on four-beam laser interference lithography[J]. Applied Physics Letters, 2013, 102(8): 081903.
[23] Zhang J, Wang Z, Di X, et al. Effects of azimuthal angles on laser interference lithography[J]. Applied Optics, 2014, 53(27): 6294-6301.
[24] 马丽娜, 张锦, 蒋世磊, 等. 入射光束角度及强度偏差对多光束干涉光刻结果的影响[J]. 光子学报, 2015, 44(10): 1011003.
Ma L N, Zhang J, Jiang S L, et al. Influence of patterns quality of multi-beam interference lithography caused by the deviations of incidence azimuth angle and intensity of light[J]. Acta Photonica Sinica, 2015, 44(10): 1011003.