压印光刻中的两步对正技术
王莉, 卢秉恒, 丁玉成, 刘红忠. 压印光刻中的两步对正技术[J]. 光子学报, 2006, 35(10): 1608.
Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. ACTA PHOTONICA SINICA, 2006, 35(10): 1608.
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王莉, 卢秉恒, 丁玉成, 刘红忠. 压印光刻中的两步对正技术[J]. 光子学报, 2006, 35(10): 1608. Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. ACTA PHOTONICA SINICA, 2006, 35(10): 1608.
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