光子学报, 2006, 35 (10): 1608, 网络出版: 2010-06-03
压印光刻中的两步对正技术
A Novel Two-Step Alignment Technique for Imprint Lithography
图 & 表
王莉, 卢秉恒, 丁玉成, 刘红忠. 压印光刻中的两步对正技术[J]. 光子学报, 2006, 35(10): 1608. Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. ACTA PHOTONICA SINICA, 2006, 35(10): 1608.