Collection Of theses on high power laser and plasma physics, 2013, 11 (1): 034305, Published Online: Jun. 2, 2017
Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO2 and SiNx films
Basic Information
| DOI: | 10.1063/1.4813507 |
| 中图分类号: | -- |
| 栏目: | 元器件与工程工艺技术 |
| 项目基金: | The authors gratefully acknowledge SCHOTT AG for providing the D263T sheets. The current work was supported by the Joint Fund of the National Natural Science Foundation of China and the China Academy of Engineering Physics (Grant No. 10976030). |
| 收稿日期: | Apr. 25, 2013 |
| 修改稿日期: | Jun. 23, 2013 |
| 网络出版日期: | Jun. 2, 2017 |
| 通讯作者: | Ming Fang (fm@siom.ac.cn.) |
| 备注: | -- |
Jingping Li, Ming Fang, Hongbo He, Jianda Shao, Zhaoyang Li. Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO2 and SiNx films[J]. Collection Of theses on high power laser and plasma physics, 2013, 11(1): 034305.
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