Collection Of theses on high power laser and plasma physics, 2013, 11 (1): 034305, Published Online: Jun. 2, 2017  

Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO2 and SiNx films

Author Affiliations
1 Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China
2 Graduate School of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Institute of Laser Plasma, Shanghai 201800, China
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Jingping Li, Ming Fang, Hongbo He, Jianda Shao, Zhaoyang Li. Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO2 and SiNx films[J]. Collection Of theses on high power laser and plasma physics, 2013, 11(1): 034305.

References

[1] R. Koch, D. Hu, and A. K. Das, Phys. Rev. Lett 94, 146101 (2005).

[2] (1991).

    R. Koch, D. Winau, A. F€uhrmann, and K. Rieder, Phys. Rev. B 44, 3369

[3] Lett. 88, 156103 (2002).

    E. Chason, B. Sheldon, L. Freund, J. Floro, and S. Hearne, Phys. Rev.

[4] A. L. Shull and F. Spaepen, J. Appl. Phys. 80, 6243 (1996).

[5] C. Friesen and C. Thompson, Phys. Rev. Lett. 89, 126103 (2002).

[6] C. Friesen, S. Seel, and C. Thompson, J. Appl. Phys. 95, 1011 (2004).

[7] M. Pletea, W. Bruckner, H. Wendrock, and R. Kaltofen, J. Appl. Phys. 97,054908 (2005).

[8] D. Winau, R. Koch, A. F€uhrmann, and K. Rieder, J. Appl. Phys. 70, 3081(1991).

[9] R. Abermann, Thin Solid Film 186, 233 (1990).

[10] M. Pletea, R. Koch, H. Wendrock, R. Kaltofen, and O. Schmidt, J. Phys:Condens. Matter 21, 225008 (2009).

[11] J. W. Shin and E. Chason, Phys. Rev. Lett. 103, 56102 (2009).

[12] M. Pletea, W. Bruckner, H. Wendrock, and R. Kaltofen, J. Appl. Phys. 99,033509 (2006).

[13] J. Floro, P. Kotula, S. Seel, and D. Srolovitz, Phys. Rev. Lett. 91, 96101 (2003).

[14] D. Winau, R. Koch, and K. Rieder, Appl. Phys. Lett. 59, 1072 (1991).

[15] F. Spaepen, Acta. Mater 48, 31 (2000).

[16] G. Abadias and P. Guerin, Appl. Phys. Lett. 93, 111908 (2008).

[17] J. Kennedy and C. Friesen, J. Appl. Phys. 101, 054904 (2007).

[18] See http://K-Space.Com/Products/Mos/ for K.M.a. Mini-MOS.

[19] G. G. Stoney, Proc. R. Soc. London Ser. A 82, 172 (1909).

[20] I. Langmuir, J. Am. Chem. Soc 40, 1361 (1918).

Jingping Li, Ming Fang, Hongbo He, Jianda Shao, Zhaoyang Li. Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO2 and SiNx films[J]. Collection Of theses on high power laser and plasma physics, 2013, 11(1): 034305.

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