Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO<sub>2</sub> and SiN<sub>x</sub> films

Jingping Li; Ming Fang; Hongbo He; Jianda Shao; Zhaoyang Li

doi:doi:10.1063/1.4813507

Collection Of theses on high power laser and plasma physics, 2013, 11 (1): 034305, Published Online: Jun. 2, 2017

Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO₂ and SiN_x films

Jingping Li ^1,2Ming Fang ^1,*Hongbo He ¹Jianda Shao ¹Zhaoyang Li ³

Author Affiliations

¹ Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China

² Graduate School of Chinese Academy of Sciences, Beijing 100049, China

³ Shanghai Institute of Laser Plasma, Shanghai 201800, China

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Jingping Li, Ming Fang, Hongbo He, Jianda Shao, Zhaoyang Li. Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO₂ and SiN_x films[J]. Collection Of theses on high power laser and plasma physics, 2013, 11(1): 034305.

Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO₂ and SiN_x films

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Influence of adsorption kinetics on stress evolution in magnetron-sputtered SiO₂ and SiN_x films