[1] Suratwala T I, Miller P E, Bude J D, et al. HF based etching processes for improving laser damage resistance of fused silica optical surfaces [J]. Journal of the American Ceramic Society, 2011, 94(2):416-428.

[2] 苏英,周永恒,黄武,等.石英玻璃与HF酸反应动力学的研究[J].硅酸盐学报, 2004, 32(3):287-293.(Su Ying, Zhou Yongheng, Huang Wu, et al. Study on reaction kinetics between silica glasses and hydrofluoric acid. Journal of the Chinese Ceramic Society, 2004, 32(3):287-293)

[3] Verhaverbeke S, Teerlinck I, Vinckier C, et al. The etching mechanisms of SiO2 in hydrofluoric acid[J]. Journal of The Electrochemical Society, 1994, 141(10):2852-2857.

[4] 成惠峰,李要辉,吴云龙,等.硅酸盐玻璃的化学处理研究进展[J].硅酸盐通报, 2011, 39(4):827-833.(Cheng Huifeng, Li Yaohui, Wu Yunlong, et al. Research progress in wet chemical etching of silicate glass. Journal of the Electrochemical Society, 2011, 39(4):827-833)

[5] Warren L. The measurement of pH in acid fluoride solutions and evidence for the existence of (HF)2[J]. Analytica Chimica Acta, 1971, 53(1):199-202.

[6] Spierings G. Wet chemical etching of silicate glasses in hydrofluoric acid based solutions[J]. Journal of Materials Science, 1993, 28(23):6261-6273.

[7] 叶鑫,黄进,王凤蕊,等.熔石英光学元件的损伤前驱及其抑制技术[J].强激光与粒子束, 2013, 25(12):3220-3224.(Ye Xin, Huang jin, Wang Fengrui, et al. Laser damage precursors in fused silica and mitigation process. High Power Laser and Particle Beams, 2013, 25(12):3220-3224)

[8] 吴宏海,吴大清,彭金莲.重金属离子与石英表面反应的实验研究[J].地球化学, 1998(6):523-531.(Wu Honghai, Wu Daqing, Peng Jinlian. Experimental study on surface reactions of heavy metal ions with quartz. Geochimica, 1998(6):523-531)

[9] Laurence T A, Bude J D, Shen N, et al. Metallic-like photoluminescence and absorption in fused silica surface flaws[J]. Applied Physics Letters, 2009, 94:151114.

[10] Miller P, Suratwala T, Bude J, et al. Laser damage precursors in fused silica[C]//Proc of SPIE. 2009:75040X.

[11] Yoshiyama J, Genin F Y, Salleo A, et al. Effects of polishing, etching, cleaving, and water leaching on the UV laser damage of fused silica[C]//Proceedings of the Laser-Induced Damage in Optical Materials. International Society for Optics and Photonics. 1998:331-340.

[12] 杨俊,易葵,魏朝阳,等.熔石英再沉积层结构的纳米级表征和杂质分析[J].强激光与粒子束, 2014, 26:072011.(Yang Jun, Yi Kui, Wei Chaoyang, et al. Structure characterization of fused silica redeposition layer in nanoscale and analysis of impurities. High Power Laser and Particle Beams, 2014, 26:072011)

[13] 蒋晓东,郑直,祖小涛,等.亚表面杂质对熔石英激光损伤的影响[J].电子科技大学学报, 2012, 41(2):238-241.(Jiang Xiaodong, Zheng Zhi, Zu Xiaotao, et al. Distribution of inclusions in fused silica sub-surface and its influence on laser-induced damage. Journal of University of Electronic Science and Technology of China, 2012, 41(2):238-241)

[14] 王卓,吴宇列,戴一帆,等.光学材料抛光亚表面损伤检测及材料去除机理[J].国防科技大学学报, 2009, 31(2):107-111.(Wang Zhuo, Wu Yulie, Dai Yifan, et al. Detection of subsurface damage and material removal mechanism in optical polishing process. Journal of National University of Defense Technology, 2009, 31(2):107-111)

[15] Liu H, Huang J, Wang F, et al. Subsurface defects of fused silica optics and laser induced damage at 351 nm[J]. Optics Express, 2013, 21(10):12204-12217.

[16] 徐世珍,吕海兵,田东斌,等.酸蚀深度对熔石英三倍频激光损伤阈值的影响[J].强激光与粒子束, 2008, 20(5):760-764.(Xu Shizhen, Lü Haibing, Tian Dongbin, et al. effects of acid-etching depth on 355 nm laser-induced damage threshold of fused silica. High Power Laser and Particle Beams, 2008, 20(5):760-764)