强激光与粒子束, 2007, 19 (8): 1390, 网络出版: 2008-02-18   

退火及超声处理对ZnO薄膜结构和发光特性的影响

Influence of annealing and supersonic treatments on structure and photoluminescence of ZnO films
作者单位
聊城大学,物理科学与信息工程学院,山东,聊城,252059
摘要
利用对向靶射频磁控溅射系统在Si(100)衬底上制备了ZnO薄膜,并对其进行了退火和超声处理.采用XRD,AFM和光致发光谱对其结构、表面形貌和性能进行了分析.结果表明:沉积态ZnO薄膜(002)择优取向稍差,尺寸较小,表面粗糙度较大.随退火温度的升高,颗粒粒径增大,样品的取向性和结晶度都明显变好,应力状态由压应力转变为张应力,粗糙度降低.超声处理缓解了薄膜中的张应力,晶粒尺寸更趋增大;用波长为280 nm的激发光激发薄膜时,沉积态薄膜无发光峰存在;随着退火温度升高,出现了一个378 nm的紫外峰和一个398 nm的紫峰;紫外峰峰值强度随退火温度升高不断增强,而紫峰的峰位随退火温度升高基本不发生变化,峰值强度增强;700 ℃退火后的薄膜经超声处理后,发光谱中出现了峰值波长为519 nm的绿色发光带.
Abstract
参考文献

[1] Bagnall D M,Chen Y F,Shen M Y,et al.Room temperature excitonic stimulated emission from zinc oxide epilayers grown by plasma-assisted MBE[J].J Crystal Growth,1998,184-185:605-609.

[2] 王旭东,何世禹,杨德庄.电子辐照对ZnO/K2SiO3型热控涂层光学性能的影响[J].强激光与粒子束,2001,13(4):431-435.(Wang X D,He S Y,Yang D Z.Dependence of ZnO/K2SiO3 thermal control coating optical characteristics upon electron exposure.High Power Laser and Particle Beams,2001,13(4):431-435)

[3] OzgürU,Alivov Y I,Liu C,et al.A comprehensive review of ZnO materials and devices[J].J Appl Phys,2005,98(4):041301.

[4] Makino T,Isoya G,Segawa Y,et al.Optical spectra in ZnO thin films on lattice-matched substrates grown with laser-MBE method[J].J Crystal Growth,2000,214-215:289-293.

[5] Jin B J,Bae S H,Lee S Y,et al.Effects of native defects on optical and electrical properties of ZnO prepared by pulsed laser deposition[J].Mater Sci Eng B,2000,71(1):301-305.

[6] Kang H S,Kang J S,Pang S S,et al.Variation of light emitting properties of ZnO thin films depending on post-annealing temperature[J].Mater Sci Eng B,2003,102(1):313-316.

[7] 徐自强,邓宏,谢娟,等.退火对ZnO:Al薄膜光致发光性能的影响[J].强激光与粒子束,2006,18(1):169-172.(Xu Z Q,Deng H,Xie J,et al.Effect of annealing on photoluminescence of ZnO:Al thin films prepared by sol-gel method.High Power Laser and Particle Beams,2006,18(1):169-172)

[8] Wang Q P,Zhang D H,Xue Z Y,et al.Violet luminescence emitted from ZnO films deposited on Si substrate by rf magnetron sputtering[J].Appl Surf Sci,2002,201:123-128.

[9] Wang Q P,Zhang D H,Xue Z Y,et al.Mechanisms of green emission from ZnO films prepared by rf magnetron sputtering[J].Optical Materials,2004,26(1):23-26.

[10] Kim D,Shimomura T,Wakaiki S,et al.Photoluminescence properties of high-quality ZnO thin films prepared by an RF-magnetron sputtering method[J].Phys B,2006,376-377:741-744.

[11] Hayashi Y,Kondo K,Murai K,et al.ZnO-SnO2 transparent conductive films deposited by opposed target sputtering system of ZnO and SnO2 targets[J].Vacuum,2004,74(3-4):607-611.

[12] Hong R J,Shao J D,He J,et al.Influence of buffer layer thickness on the structure and optical properties of ZnO thin films[J].Appl Surf Sci,2006,252(8):2888-2893.

[13] 方泽波,龚恒翔,刘雪芹,等.退火对多晶ZnO薄膜结构与发光特性的影响[J].物理学报,2003,52(7):1748-1751.(Fang Z B,Gong H X,Liu X Q,et al.Effects of annealing on the structure and photoluminescence of ZnO films.Acta Physica Sinica,2003,52(7):1748-1751)

[14] Xu X L,Guo C X,Qi Z M,et al.Annealing effect for surface morphology and luminescence of ZnO film on silicon[J].Chem Phys Lett,2002,364:57-63.

[15] Zhang Y T,Du G T,Liu D L,et al.Crystal growth of undoped ZnO films on Si substrates under different sputtering conditions[J].J Crystal Growth,2002,243:439-443.

[16] 袁艳红,侯洵,高恒.超声处理对ZnO薄膜光致发光特性的影响[J].物理学报,2006,55(1):446-449.(Yan Y H,Hou X,Gao H.Effect of ultrasonic treatment on ZnO film photoluminescence.Acta Physica Sinica,2006,55(1):430-436)

徐东然, 肖效光, 王长征, 张一清, 张栋, 高学喜, 刘云龙. 退火及超声处理对ZnO薄膜结构和发光特性的影响[J]. 强激光与粒子束, 2007, 19(8): 1390. 徐东然, 肖效光, 王长征, 张一清, 张栋, 高学喜, 刘云龙. Influence of annealing and supersonic treatments on structure and photoluminescence of ZnO films[J]. High Power Laser and Particle Beams, 2007, 19(8): 1390.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!