磁性复合流体分散性及其对BK7光学玻璃抛光性能的影响

姜晨; 时培兵; 李佳音; 张勇斌

doi:doi:10.3788/gzxb20194805.0516004

光子学报, 2019, 48 (5): 0516004, 网络出版: 2019-06-12

磁性复合流体分散性及其对BK7光学玻璃抛光性能的影响

Dispersion of Magnetic Compound Fluid and Its Effect on Polishing Properties of BK7 Optical Glass

论文大纲

姜晨 ^1,*时培兵 ¹李佳音 ¹张勇斌 ²

作者单位

¹ 上海理工大学机械工程学院, 上海 200093

² 中国工程物理研究院机械制造工艺研究所, 四川绵阳 621000

摘要

针对BK7光学玻璃材料去除率和抛光质量不断提高的需求, 提出通过减少磁性复合流体(MCF)抛光液颗粒的团聚、提高MCF分散性, 配制性能优良的抛光液, 提高BK7光学玻璃的MCF抛光性能.MCF中添加不同质量分数的高分子类分散剂聚乙烯醇(PVA), 采用激光粒度分布仪测试MCF抛光液中颗粒的粒径分布和中位粒径, 探究不同PVA浓度的抛光液对BK7光学玻璃抛光性能的影响.试验结果表明：当PVA质量分数为3%时, 中位粒径达到最小值5.854 μm, MCF的分散性最好, 对光学玻璃的抛光性能大幅提高, 当PVA质量分数为5%时, 经MCF抛光10 min后材料去除率达到最大值26.4×10－4g/min, 表面粗糙度达到最小值8.23 nm. MCF中添加适量PVA能够减少抛光液颗粒的团聚, 提高MCF的分散性, 提升BK7光学玻璃的磁性复合流体抛光性能.

Abstract

In order to meet the demand of improving the material removal rate and polishing quality of BK7 optical glass, it is proposed to improve the dispersion of the polishing fluid and prepare the polishing liquid with excellent properties by decreasing the agglomeration of the polishing fluid particles of the Magnetic Compound Fluid (MCF), improving MCF polishing performance of BK7 optical glass. Polyving Akohol (PVA), apolymer dispersant, with different mass fraction was added to MCF to analyze the particle size distribution and median particle size in the MCF polishing fluid. The effect of different amount of PVA polishing liquid on the polishing performance of BK7 optical glass was investigated. The experimental results show that when the mass fraction of PVA is 3%, the median particle size reaches the minimum of 5.854 μm, the dispersion of the MCF is the best, and the polishing performance is greatly improved. When the mass fraction of PVA is 5%, the maximum of material removal rate is 26.4×10－4g/min, and the surface roughness reached the minimum of 8.23 nm after MCF polishing 10 minutes. The addition of proper amount of PVA to the MCF, it can decrease the problem of polishing fluid particle agglomeration, improve the dispersion of the MCF, improve the Magnetic Composite Fluid polishing performance of BK7 optical glass.

参考文献

[1] 张小兵. 非球面光学元件加工及检测技术综述［J］. 兵器材料科学与工程, 2014, 2(37): 106-111.

ZAHNG Xiao-bing. Review on processing and testing technology of aspheric optical elements［J］. Weapon Materials Science and Engineerin, 2014, 37(2): 106-111.

[2] 朱永伟, 李信路, 王占奎, 等. 光学硬脆材料固结磨料研磨中的亚表面预测［J］. 光学精密工程, 2017, 25(2): 368-374.

ZHU Yong-wei, LI Xin-lu, WANG Zhan-kui, et al. Subsurface prediction in abrasive grinding of optical hard and brittle materials［J］. Optical Precision Engineering, 2017, 25(2): 368-374 .

[3] SHIMADA K, OKA H. Magnetic characteristics of magnetic compound fluid (MCF) under DC and AC magnetic fields［J］. Journal of Magnetism and Magnetic Materials, 2005, 290(2): 804-807.

[4] WU Yong-bo, WANG You-liang, MASAKAZU F, et al. Nano-precision polishing of CVD SiC using MCF(Magnetic Compound Fluid) slurry ［J］. Journal of the Korean Society of Manufacturing Technology Engineers, 2014, 23(6): 547-554.

[5] GUO Hui-ru, WU Yong-bo, LU Dong, et al. Ultrafine polishing of electroless nickel-phosphorus-plated mold with magnetic compound fluid slurry［J］. Materials and Manufacturing Processes, 2014, 29(6): 1502-1509.

[6] 陈逢军, 尹韶辉, 余剑武, 等. 磁流变光整加工技术研究进展［J］. 中国机械工程, 2011, 22(19): 2382-2392.

CHEN Feng-jun, YIN Yun-hui, YU Jian-wu,et al. Research progress of magnetorheological finishing technology ［J］. China Mechanical Engineering, 2011, 22(19): 2382-2392.

[7] GUO Hui-ru, WU Yong-bo, LU Dong, et al. Effects of pressure and shear stress on material removal rate in ultra-fine polishing of optical glass with magnetic compound fluid slurry ［J］. Journal of Material Processing Technology, 2014, 214(11): 2759-2769.

[8] 王慧军, 张飞虎, 赵航, 等. 超声波磁流变复合抛光中几种工艺参数对材料去除率的影响［J］. 光学精密工程, 2007, 15(10) 1584-1587.

WANG Hui-jun, ZHANG Fei-hu, ZHAO Hang, et al. Effect of several technological parameters on material removal rate in ultrasonic magnetorheological composite polishing［J］. Optical Precision Engineering, 2007, 15(10) 1584-1587.

[9] SHIMADA K, AKAGAMI Y, FUJITA T. Characteristics of magnetic compound fluid (MCF) in a rotating rheometer［J］. Journal of Magnetism and Magnetic Materials, 2002, 252(10): 235-237.

[10] SHIMADA K, WU Yong-bo, WANG You-liang. Effect of magnetic cluster and magnetic field on polishing using magnetic compound filud(MCF)［J］. Journal of Magnetism and Magnetic Materials, 2003, 262(2): 242-247.

[11] 吴媛媛, 衣守志, 魏志杰, 等. 氧化铈抛光液悬浮性和再分散性研究［J］. 中国粉体技术, 2015, 21(2): 57-60.

WU Yuan-yuan, YI Shou-zhi, WI Zhi-jie, et al. Study on suspension and redispersity of Ceric oxide polishing liquid［J］. Chinese Powder Technology, 2015, 21(2): 57-60.

[12] 梁尚娟, 汤文龙, 焦翔, 等. 改变抛光剂对光学玻璃抛光质量的影响［J］. 中国激光, 2017, 44(12): 1203001.

LIANG Shang-juan, TANG Wen-long, JIAO Xiang, et al. Effect of changing agent on polishing qulity of optical glass［J］. Chinese Journal of Laser, 2017, 44(12): 1203001.

[13] 李庆忠, 施卫彬, 夏明光. 硒化锌晶体精细雾化抛光液及去除机理研究［J］. 表面技术, 2018, 47(6): 271-276.

LI Qing-zhong, SHI Wei-bing, XIA Ming-guang. Study on fine atomization and removal mechanism of zinc selenide crystal［J］. Surface Technology, 2017,47(6): 271-276.

[14] 许雪峰, 马冰迅, 胡建德, 等. 无抛光垫化学机械抛光技术研究［J］. 中国机械工程, 2008, 19(20): 2407-2410.

XU Xue-feng, MA Bing-xun, HU Jian-de, et al. Study on chemical mechanical polishing technology without polishing pad［J］. China Mechanical Engineering, 2008, 19(20): 2407-2410.

[15] 王金普, 白林山, 储向峰. 硬盘微晶玻璃基板化学机械抛光研究［J］. 人工晶体学报, 2015, 44(1): 216-220.

WANG Jin-pu, BAI Lin-shan, CHU Xiang-feng, et al. Study on chemical and mechanical polishing of hard disk glass-ceramics substrate［J］. Journal of Intraocular Crystals, 2015,44(1): 216-220.

[16] 白亚雯, 陈国美, 藤康, 等. 阳离子表面活性剂对A向蓝宝石晶片化学机械抛光效率的影响［J］. 人工晶体学报, 2018, 47(3): 470-475.

BAI Ya-wen, CHEN Guo-mei, TENG Kang, et al. Effect of cationic surfactant on the chemical and mechanical polishing efficiency of a sapphire wafer［J］. Journal of Intraocular Crystals, 2018, 47(3): 470-475.

[17] 姚伟强, 马国伟, 金清波, 等. 静电层层自组装复合磨粒及抛光液的抛光性能研究［J］. 中国机械工程, 2013,24(6): 742-746.

YAO Wei-qiang, MA Guo-wei, JIN Qing-bo, et al. Study on polishing performance of electrostatic layer self-assembled composite abrasive and polishing liquid［J］. China Mechanical Engineering, 2013,24(6): 742-746.

[18] LI Jun, HUANG Jian-dong, XIA Lei, et al. Effect of chemical additive on fixed abrasive pad self-conditioning in CMP ［J］. International Journal of Advanced Manufacturin Technology, 2017, 88(1-4): 107-113.

姜晨, 时培兵, 李佳音, 张勇斌. 磁性复合流体分散性及其对BK7光学玻璃抛光性能的影响[J]. 光子学报, 2019, 48(5): 0516004. JIANG Chen, SHI Pei-bing, LI Jia-yin, ZHANG Yong-bin. Dispersion of Magnetic Compound Fluid and Its Effect on Polishing Properties of BK7 Optical Glass[J]. ACTA PHOTONICA SINICA, 2019, 48(5): 0516004.

磁性复合流体分散性及其对BK7光学玻璃抛光性能的影响

关于本站 Cookie 的使用提示

全站搜索

磁性复合流体分散性及其对BK7光学玻璃抛光性能的影响

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索