光子学报, 2019, 48 (5): 0516001, 网络出版: 2019-06-12
激光功率密度对相同曝光量下氧化石墨烯还原的影响
Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure
基本信息
| DOI: | 10.3788/gzxb20194805.0516001 |
| 中图分类号: | TB383;O644 |
| 栏目: | |
| 项目基金: | The National Natural Science Foundation of China (No. 61405019), Chongqing Basic and Frontier Research Project (No. cstc2014jcyjA50023) |
| 收稿日期: | 2018-11-08 |
| 修改稿日期: | 2019-02-22 |
| 网络出版日期: | 2019-06-12 |
| 通讯作者: | 谢磊 (xielei@cqu.edu.cn) |
| 备注: | -- |
谢磊, 雷小华, 谭小刚, 刘显明, 邓益俊, 陈伟民. 激光功率密度对相同曝光量下氧化石墨烯还原的影响[J]. 光子学报, 2019, 48(5): 0516001. XIE Lei, LEI Xiao-hua, TAN Xiao-gang, LIU Xian-ming, DENG Yi-jun, CHEN Wei-min. Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure[J]. ACTA PHOTONICA SINICA, 2019, 48(5): 0516001.
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