光子学报, 2019, 48 (5): 0516001, 网络出版: 2019-06-12  

激光功率密度对相同曝光量下氧化石墨烯还原的影响

Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure
作者单位
重庆大学 光电工程学院 光电技术及系统教育部重点实验室, 重庆 400044
引用该论文

谢磊, 雷小华, 谭小刚, 刘显明, 邓益俊, 陈伟民. 激光功率密度对相同曝光量下氧化石墨烯还原的影响[J]. 光子学报, 2019, 48(5): 0516001.

XIE Lei, LEI Xiao-hua, TAN Xiao-gang, LIU Xian-ming, DENG Yi-jun, CHEN Wei-min. Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure[J]. ACTA PHOTONICA SINICA, 2019, 48(5): 0516001.

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谢磊, 雷小华, 谭小刚, 刘显明, 邓益俊, 陈伟民. 激光功率密度对相同曝光量下氧化石墨烯还原的影响[J]. 光子学报, 2019, 48(5): 0516001. XIE Lei, LEI Xiao-hua, TAN Xiao-gang, LIU Xian-ming, DENG Yi-jun, CHEN Wei-min. Effect of Laser Power Density on Reduction of Graphene Oxide under the Same Exposure[J]. ACTA PHOTONICA SINICA, 2019, 48(5): 0516001.

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