激光与光电子学进展, 2016, 53 (5): 053401, 网络出版: 2016-05-05
极紫外光刻动态气体锁抑制率的理论研究 下载: 853次
Theoretical Investigation on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography
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陈进新, 王宇, 谢婉露. 极紫外光刻动态气体锁抑制率的理论研究[J]. 激光与光电子学进展, 2016, 53(5): 053401. Chen Jinxin, Wang Yu, Xie Wanlu. Theoretical Investigation on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography[J]. Laser & Optoelectronics Progress, 2016, 53(5): 053401.