中国激光, 2008, 35 (12): 2026, 网络出版: 2008-12-17
355 nm增透膜的设计、制备与性能
Design, Preparation and Characterization of 355 nm Antireflection Coatings
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余华, 崔云, 申雁鸣, 齐红基, 易葵, 邵建达, 范正修. 355 nm增透膜的设计、制备与性能[J]. 中国激光, 2008, 35(12): 2026. Yu Hua, Cui Yun, Shen Yanming, Qi Hongji, Yi Kui, Shao Jianda, Fan Zhengxiu. Design, Preparation and Characterization of 355 nm Antireflection Coatings[J]. Chinese Journal of Lasers, 2008, 35(12): 2026.