中国激光, 2002, 29 (2): 149, 网络出版: 2006-08-08  

射频阱中基态Sc3+与Ti3+多电荷离子的产生及存储特性

Production and Storage Property of Ground Multiply-charged Ions of Sc3+ and Ti3+ in RF Ion Trap
作者单位
1 中国科学院武汉物理与数学研究所波谱与原子分子物理国家重点实验室,湖北武汉,430071
2 北京理工大学光电工程系,北京,100081
摘要
结合离子阱选择囚禁技术和垂直交叉的离子束碰撞冷却方法,在射频阱中用激光溅射纯金属靶产生并选择囚禁了难熔元素钪与钛的低能多电荷离子Scn+(n=1~3)和Tin+(n=1~4).在本底气压为5.6×10-7 Pa下,测得Sc3+与Ti3+离子的衰减速率分别为1.98 s-1与0.58 s-1.
Abstract
By means of the selective trapping and two separated crossed ion beams at right angles, the ground low energy (electron volt) multiply charged Sc n+ (n=1~3) and Ti n+ (n=1~4) ions have been produced from refractory pure metal targets in a RF ion trap. The measured decay rates of Sc 3+ and Ti 3+ are 1.98 s -1 and 0.58 s -1 with the base pressure 5.6×10 -7 Pa, respectively.
参考文献

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蒋玉蓉, 聂宗秀, 李交美, 高克林. 射频阱中基态Sc3+与Ti3+多电荷离子的产生及存储特性[J]. 中国激光, 2002, 29(2): 149. 蒋玉蓉, 聂宗秀, 李交美, 高克林. Production and Storage Property of Ground Multiply-charged Ions of Sc3+ and Ti3+ in RF Ion Trap[J]. Chinese Journal of Lasers, 2002, 29(2): 149.

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