XUV成像系统中像传递函数研究用的Si刻蚀膜
[1] Kalantar D H, Da Sliva L B, Glendinning S G, et al. Extreme ultraviolet probing of laser imprint in a thin foil using an X-ray laser backlighter[J]. Review o f Scientific Instruments, 1997,68(1) :802-805.
[2] Kalantar D H, Key M H, Da Silva L B, et al. Measurement of 0. 35 μm laser imprint in a thin Si foil using an X-ray laser backlighter[J].Physical Review Letters, 1996,76(19) :3574-3577.
[4] 周斌,韩明,徐平,等.驱动光束不均匀性实验研究中的硅平面薄膜[J].强激光与粒子束,2000,12(2):181-184.
Zhou B,Hah M,Xu P,et al. Thin silicon foil used to study the spatial nonuniformity in the driven intensity. High Power Laser and Particle Beams, 2000, 12(2):181-184.
[5] 黄庆安.硅微机械加工技术[M].北京:科学出版社,1996.
Huang Q A.Silicon micromachiningtechnology.Beijing:Science Press,1996.
[6] 赵丽华,周名辉,王书明,等.离子束刻蚀[J].半导体技术,1999,24(1):39-42.
Zhao L H,Zhou M H,Wang S M,et al. Ion beam etching.Semiconductor Technology,1999,24(1):39-42.
[7] 李红军,卢振武,廖江红,等.离子束刻蚀过程中台阶侧壁倾斜现象研究[J].微细加工技术,2000,(1):28-33.
Li H J,Lu Z W,Liao J H,et al. Study on step sidewalltiltin ion beam etching of Fresnellens.Micro fabrication Technology,2000,(1):28-33.
[8] 胡新宁,刘刚,田扬超.离子束刻蚀入射角对图形侧壁陡度影响的研究[J].微细加工技术,2003,(4):14-17.
Hu X N,Liu G,Tian Y C. Influence of ion-beam etching incidence angle on slope of pattern sidewall. Micro fabrication Technology, 2003, (4):14-17.
周斌, 孙骐, 韩明, 熊斌, 吴广明, 黄耀东, 沈军. XUV成像系统中像传递函数研究用的Si刻蚀膜[J]. 强激光与粒子束, 2005, 17(1): 47. ZHOU Bin, SUN Qi, HAN Ming, XIONG Bin, WU Guang-ming, HUANG Yao-dong, SHEN Jun. Silicon grating foil used to analyze the image transfer function in XUV radiography system[J]. High Power Laser and Particle Beams, 2005, 17(1): 47.