透明导电薄膜被广泛应用于平板显示，太阳能电池等发光行业。透明导电薄膜厚度的减少将导电薄膜的用途大为拓展，目前该薄膜的制备仍然是研究热点。采用激光分子束外延（LMBE）镀膜系统在1.0×10-5 Pa的高真空下制备了不同厚度、不同氧压下的ZnO单层膜以及ZnO/Au/ZnO三明治结构薄膜，并进行了光谱及电阻率的测试，运用控制变量法得到ZnO和Au的最优膜层厚度。制备出通透性好（可见光透射率80%以上）、电阻率低(6.89×10-4 Ω·cm)厚度均匀的透明导电薄膜。

Transparent conducting films are widely used in flat panel display, photo voltaic solar cell and other lighting industries. The decreasing thickness of transparent conducting film expands the application of those films. The different thicknesses of single ZnO film and ZnO/Au/ZnO structure films are deposited by laser molecular beam epitaxy system at a pressure 1.0×10-5 Pa. A high quality transparent electrode with resistivity as low as 6.89×10-4 Ω·cm and high transmittance of 80% in visible region is obtained.