Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Yuanfang Li; Huoyao Chen; Stefanie Kroker; Thomas Käsebier; Zhengkun Liu; Keqiang Qiu; Ying Liu; Ernst-Bernhard Kley; Xiangdong Xu; Yilin Hong; Shaojun Fu

doi:doi:10.3788/COL201614.090501

Chinese Optics Letters, 2016, 14 (9): 090501, Published Online: Aug. 3, 2018

Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings Download： 1250次

Yuanfang Li ¹Huoyao Chen ¹Stefanie Kroker ^2,3,4Thomas Käsebier ²Zhengkun Liu ¹Keqiang Qiu ¹Ying Liu ^1,*Ernst-Bernhard Kley ²Xiangdong Xu ¹Yilin Hong ¹Shaojun Fu ¹

Author Affiliations

¹ National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

² Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, Jena 07743, Germany

³ Technische Universität Braunschweig, Laboratory for Emerging Nanometrology, Pockelsstr. 14, Braunschweig 38106, Germany

⁴ Physikalisch-Technische Bundesanstalt, Bundesallee 100, Braunschweig 38116, Germany

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Yuanfang Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu. Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings[J]. Chinese Optics Letters, 2016, 14(9): 090501.

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